Optics for generation of high current density patterned charged particle beams

ABSTRACT

A direct-write electron beam lithography system employing a patterned beam-defining aperture to enable the generation of high current-density shaped beams without the need for multiple beam-shaping apertures, lenses and deflectors is disclosed. Beam blanking is accomplished without the need for an intermediate crossover between the electron source and the wafer being patterned by means of a double-deflection blanker, which also facilitates proximity effect correction. A simple type of “moving lens” is utilized to eliminate off-axis aberrations in the shaped beam. A method for designing the patterned beam-defining aperture is also disclosed.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. Non-Provisional applicationSer. No. 10/962,049 filed Oct. 7, 2004 now U.S. Pat. No. 7,462,848,which claims the benefit of U.S. Provisional Application Ser. No.60/509,582 filed Oct. 7, 2003 and U.S. Provisional Application Ser. No.60/582,014 filed Jun. 21, 2004, both all incorporated by referenceherein.

BACKGROUND OF THE INVENTION

1. Field of the Invention

This invention relates to the field of charged particle optics, and inparticular to methods and systems for generation of high current densityshaped electron beams.

2. Description of the Related Art

The use of electron beams to lithographically pattern semiconductormasks, reticles and wafers is an established technique. The differentwriting strategies used may be characterized by a few key parameters:

Beam Positioning Strategy

There are two main approaches to the positioning of electron beams forthe exposure of resist during the lithographic process:

-   -   (a) Raster Scanning, where the beam is moved on a regular        two-dimensional lattice pattern. This method has the advantage        that the scan electronics is typically simpler, but the        disadvantage is that the beam may spend large amounts of time        moving across areas not needing to be exposed. In addition, in        order to accomplish very precise pattern edge placement,        sophisticated gray-scale and/or multiple-pass scanning may be        required.    -   (b) Vector Scanning where the beam is moved two-dimensionally        directly to areas to be written. This method has the advantage        of reduced time over areas not needing to be exposed, but the        disadvantage of more complicated and expensive deflection        electronics. Precise pattern edge placement is also easier,        utilizing the beam placement capability on a 2D address grid        much smaller than the beam size.        Each approach is advantageous in certain circumstances, the        optimum choice depending on the pattern critical dimensions,        pattern density (% of area to be written), and also on the        profile of the beam current distribution (see below).        Beam Shape Control

There are two well-known approaches to the shaping of the electron beamused to expose the resist on the substrate:

-   -   (a) Gaussian beams are characterized by the highest current        densities (typically >2000 A/cm²) since in these systems, an        image of the electron source is focused onto the substrate        surface, thereby taking full advantage of the high brightness of        the source. A key disadvantage of Gaussian beams is their long        tails of current, stretching far outside the central beam        diameter—only 50% of the beam current at the substrate falls        within the FWHM of a two-dimensional Gaussian distribution.    -   (b) Shaped Beams are formed by electron optical columns        typically having several intermediate shaping apertures,        combined with additional deflectors and lenses to form a focused        image of the aperture(s) on the substrate surface. These systems        typically have beam current densities orders-of-magnitude lower        (e.g. 20-50 A/cm²) than for the Gaussian beams. An advantage of        these systems is the reduced current tails outside the desired        beam shape, making patterning less susceptible to process        fluctuations. Another advantage is that effectively a large        number of pixels may be written simultaneously since the area of        the variable shaped beam may be large in comparison to a single        pixel.

There is a need in the semiconductor industry to achieve the highestpatterning throughputs, both for mask and reticle writing as well aspotentially for the direct writing of wafers. Either of the twoapproaches to beam positioning can be combined with either of the twoapproaches to beam shaping, but none of these four combinations iscapable of fully meeting the semiconductor industry's needs. Clearlythere is a need for an electron lithography system having highthroughput (at least several wafers/hour or less than an hour to write areticle), combined with the ability to pattern very small CDs with edgeplacement accuracies <CD/8, as well as the simplest possible electronoptical design to ensure adequate system reliability, longmean-time-between-failures (MTBF) and short mean-time-to-repair (MTTR).

SUMMARY OF THE INVENTION

A charged particle optical apparatus for generating a high currentdensity shaped beam is disclosed herein. This apparatus utilizes acharged particle optical column design, typical of those used togenerate high current density Gaussian beams, with the addition of apatterned beam-defining aperture which can be customized for insertionat various positions in the column. One example of a charged particleoptical column design would employ two lenses, wherein a chargedparticle source emits a diverging beam of charged particles which arethen formed into a roughly parallel charged particle beam by the firstlens. The second lens then focuses the roughly parallel charged particlebeam onto the surface of a substrate with a generally Gaussian currentdistribution, having a high current density at the center and long tailsextending out in all directions from the center of the beam. In thisexample, the patterned beam-defining aperture could be positionedbetween the two lenses. Based on the design requirements of the patternto be written, a beam shape at the substrate is determined. The shape ofthe patterned beam-defining aperture (PBDA) is then developed in amulti-step method disclosed herein. The PBDA shape must meet tworequirements: (1) it should transmit a large portion of chargedparticles in the beam which would fall within the predetermined beamshape, and (2) it should block transmission of a large portion ofcharged particles in the beam which would fall outside the predeterminedbeam shape.

In a charged particle optical system employing the present invention, anumber of additional components may be included, such as:

A Beam blanker—used to turn the beam on and off by deflecting the beamonto a blanking aperture. In the embodiment of the present inventionillustrated herein, the PBDA also functions as the blanking aperture.

Deflectors—used to move the beam across the surface of the substrate inorder to pattern an area. In this embodiment, a double-deflection maindeflector moves the beam to the centers of 2 μm square subfields. Withineach subfield, a subfield deflector consisting of a single octupoledeflects the beam.

Moving Lenses—in order to minimize off-axis aberrations in the shapedbeam, the effective optical axis of the second lens is displacedoff-axis to match the beam deflection due to the mainfield deflector.

Stigmator—used to correct for imperfections in the optical columnarising from mechanical defects or positioning errors in variouselements.

The design method for the patterned beam-defining aperture starts withdata about the pattern to be written (such as the IC dimensions andlayout on the wafer, the critical dimensions of the IC, alignment markdesigns, etc.) and combines this data with the optical characteristicsof the charged particle beam column to determine the optimal shaped beamsizes to enable the patterns to be written with maximum efficiency(i.e., highest throughput). The PBDA design is then developed, first asan ideal shape, and then with modifications to enable it to bemanufactured. After a proposed PBDA design is found, it is tested usingthe same procedure used to originally develop the design, typicallyemploying charged particle design software using ray-tracing to simulateactual charged particles under the influence of electric and magneticfields shaped by the electrodes and pole-pieces of the optical column.

The shaped beam generated by this column is characterized by improvedcurrent profile edge sharpness relative to a Gaussian beam, as well as anearly square current distribution at the resist exposure dose (thelatter being very desirable for lithography applications). Advantages ofthis apparatus include the ability to generate a shaped beam without theadded complexity of shaping apertures, deflectors and lenses typicallyfound in variable-shaped beam columns. In addition, current densitiesapproaching those of Gaussian beam systems are achieved, greatlyreducing resist exposure times and enhancing writing throughputs inlithography applications.

A method is described for designing the patterned beam-defining aperture(PBDA). The core of this method involves ray tracing to determine whichrays in the charged particle beam contribute to a desired beam profileat the substrate at a number of positions across the substrate surface,followed by a design process for a patterned beam-defining aperturewhich transmits rays contributing to the desired beam profile and blocksrays falling outside the desired profile. Further innovative aspects ofthe invention are described in the following paragraphs.

Blanking System—the apparatus disclosed herein employs a unique blankingsystem which does not require the use of an intermediate crossoverbetween the electron source and the wafer. A double-deflection blankeris used to project the effective blanking plane back to the position ofthe virtual source. This is advantageous since the absence of anintermediate crossover substantially reduces space charge beam spreadingarising from electron-electron interactions. A further advantage of thedouble-deflection blanker geometry is the ability to blank beams over amuch wider range of beam sizes—in prior art designs, since the (single)blanker had to be positioned at the cross-over for conjugate blanking,it was not possible to achieve the wide range of beam sizes (<30 nmto >120 nm) possible with the present invention since such a wide sizerange necessitates moving the cross-over to various (widely-spaced)positions along the optical axis in order to vary the columnmagnification. Another novel aspect of the blanking system is the use ofa square beam-trimming aperture above the blankers to reduce the beamsize and shape the beam into a square cross-section. This has theadvantage that the beam is shaped to be only slightly larger than thePBDA (which also serves as the blanking aperture) thereby maximizing theattainable blanking speed. In addition, a square beam, when swept acrossthe PBDA, will uniformly illuminate every part of the PBDA openings,thereby making the deposited current on the wafer more uniform withinthe shaped beam.

Main Deflectors—the present invention employs a unique main deflectordesign, optimized for the requirement to deflect the patterned beam amuch larger distance off-axis in one direction (typically >25 μm) thanin the other direction (˜1 μm). The deflector design employs a largenumber of separate electrodes (22 in the embodiment herein), butrequires only four drive signals. The arrangement of the 22 deflectorelectrodes simulates the electric field generated by a set of parallelplates, which is more uniform than is possible with prior art octupoledesigns. A more uniform electric field reduces the deflectionaberrations induced in the beam, enabling sharper edge profiles in thepatterned beam of the invention described herein. Prior art deflectorsemploy symmetrical octupole designs which would have increasedaberrations for the large deflections required here.

Main Lens Design—to form a shaped high current-density beam on the wafersurface across a wide range of positions off-axis (at least 25 μm), thepresent invention employs a main lens structure in which the effectiveaxis of the lens can be moved in synchrony with the deflection of thebeam so that the beam always appears to be on the optical axis of themain lens. The lens structure of the present invention employs two setsof octupole electrodes integrated within the lens structure to add smalltransverse dipole fields to the generally axial electric fields of thelens. These dipole fields can offset the axial field by >25 μm in orderto center the lens on the beam. Thus, the beam always undergoes afocusing effect nearly identical to that found on axis. This isadvantageous since all off-axis aberrations, both geometrical (coma,astigmatism, curvature of field, distortion) and chromatic (variation inmagnification) are essentially eliminated, thereby improving the edgesharpness of the patterned beam. Prior art systems employing “movinglenses” required much more complicated electrode designs than thoseemployed herein.

Control System—the control system for the multicolumn opticsaccommodates a number of optical elements that are in common for allcolumns, and thus may be controlled by single controls, while otheroptical elements require individual controls, one for each column.

Pattern Data Path—the data path for the present invention employs anumber of features required by the need to coordinate patterning of anumber of columns simultaneously. It is necessary to stitch the writtenpatterns of all columns together in order to preserve pattern quality onthe wafer. In addition, for maximum writing efficiency, variouspatterned high current-density beams may be generated (different sizesin each column, if necessary). Thus one column might be writing 30 nmfeatures while another column simultaneously is employing a 120 nmshaped beam to write a bonding pad containing a number of 2 μm squaresubfields.

Proximity Effect Correction Method—for correction of proximity effects,the present invention employs a method of subfield-by-subfield beam dosevariation to minimize the beam writing dose in order to maximize processlatitude during resist development. An iterative process is employed,wherein the fraction of area to be written in each subfield isdetermined, and then used to modify the doses in neighboring subfieldsto correct for backscattered electron (BSE) contributions to the totalresist exposure.

BRIEF DESCRIPTION OF THE FIGURES

FIG. 1 shows a flow chart of the design procedure for an electronoptical system employing a patterned beam-defining aperture, for use ingenerating high intensity patterned electron beams.

FIG. 2A shows a cross-sectional view of an electron optical columnutilizing a non-circular aperture to produce a high current-densitypatterned electron beam.

FIG. 2B shows a cross-sectional view of the bottom of the electroncolumn of FIG. 2A.

FIG. 3A shows various views of rays near the source tip 201.

FIG. 3B shows various views of rays in the upper alignmentdeflector/stigmator 207.

FIG. 3C shows various views of rays in the lower alignment deflector208.

FIG. 3D shows various views of rays just above the beam-trimmingaperture 276.

FIG. 3E shows various views of rays in the beam blanker.

FIG. 3F shows a view of rays in the lower beam blanker 278.

FIG. 3G shows various views of rays just above the beam-definingaperture 212.

FIG. 3H shows a view of rays inside the upper mainfield deflector 213and a schematic of the mainfield deflector.

FIG. 3I shows a view of rays inside the lower mainfield deflector 214.

FIG. 3J shows a view of rays inside the subfield deflector/stigmator215.

FIG. 3K shows a view of rays inside the focus-1 electrode assembly 216.

FIG. 3L shows a view of rays inside the focus-2 electrode assembly 217.

FIG. 3M shows a view of rays inside the field-free tube 218.

FIG. 4A shows a graph of a first circular beam profile centered on theoptical axis (0,0) and in the plane of the wafer, prior to insertion ofa first patterned aperture into the column of FIG. 2A; a desired squareprofile is superimposed on the graph.

FIG. 4B shows a graph of a first circular beam profile centered +12.5 μmoff the optical axis and in the plane of the wafer, prior to insertionof a first patterned aperture into the column of FIG. 2A; a desiredsquare profile is superimposed on the graph.

FIG. 4C shows a graph of a first circular beam profile centered +25 μmoff the optical axis and in the plane of the wafer, prior to insertionof a first patterned aperture into the column of FIG. 2A; a desiredsquare profile is superimposed on the graph.

FIG. 5 shows a graph of an ideal beam profile centered on the opticalaxis (0,0) and in the plane of the wafer, after insertion of a patternedaperture into the column of FIG. 2A.

FIG. 6A shows a graph of idealized beams transmitted by the patternedbeam-defining aperture 212 in the column of FIG. 2A.

FIG. 6B shows a graph of idealized beams blocked by the patternedbeam-defining aperture 212 in the column of FIG. 2A.

FIG. 7A shows a graph of actual beams transmitted by the patternedbeam-defining aperture 212 in the column of FIG. 2A.

FIG. 7B shows a graph of actual beams blocked by the patternedbeam-defining aperture 212 in the column of FIG. 2A.

FIG. 8A shows a patterned beam-defining aperture (PBDA) designed togenerate a high current-density square electron beam at the wafer andrays at 5000 eV beam energy.

FIG. 8B shows the mapping of rays passing through the center portion ofthe PBDA to the ray intersections at the wafer surface.

FIG. 8C shows the mapping of rays passing through the outer portions ofthe PBDA to the ray intersections at the wafer surface.

FIG. 9 shows a diagram of the various beam positions A-D at the wafersurface used for calculation of beam profiles.

FIG. 10A shows a calculated exposure dose due to a single flash of a 40nm square electron beam, when the beam is in position A of FIG. 9.

FIG. 10B shows a calculated exposure due to a single flash of a 40 nmsquare electron beam, when the beam is in position B of FIG. 9.

FIG. 10C shows a calculated exposure dose due to a single flash of a 40nm square electron beam, when the beam is in position C of FIG. 9.

FIG. 10D shows a calculated exposure dose due to a single flash of a 40nm square electron beam, when the beam is in position D of FIG. 9.

FIG. 11 shows a calculated exposure dose due to three flashes of the 40nm square electron beam (all flashes as in FIG. 10A) abutting in an “L”pattern with spacings of 40 nm, when the beam is in position A of FIG.9.

FIG. 12 shows a calculated exposure dose due to two overlapping flashesof the 40 nm square electron beam and a separate single flash (allflashes as in FIG. 1A), when the beam is in position A of FIG. 9.

FIG. 13 shows a graph of calculated beam current density across a single40 nm square beam (as in FIG. 10A), when the beam is in position A ofFIG. 9, and across a single 40 nm FWHM Gaussian beam.

FIG. 14 shows a graph of calculated beam current density, when the beamis in position A of FIG. 9, across three combined 40 nm square beams(all flashes as in FIG. 10A and spaced 40 nm apart) and across threecombined 40 nm FWHM Gaussian beams also spaced 40 nm apart.

FIG. 15 shows a graph of calculated beam current density, when the beamis in position A of FIG. 9, across three combined 40 nm square beams andthree separate 40 nm square beams (all flashes as in FIG. 10A), with thebeams spaced 40 nm apart.

FIG. 16 shows a graph of calculated beam current density across threecombined 40 nm FWHM Gaussian beams and three separate 40 nm FWHMGaussian beams, with all beams spaced 40 nm apart.

FIG. 17A shows a diagram of a possible beam-scanning method for use insetting up the optics to generate an optimized square beam profile.

FIG. 17B shows calculated line scans for the various scan directions ofFIG. 17A, illustrating a potential method for setting up an optimized 40nm square beam profile.

FIG. 18 shows a calculated exposure dose due to a single flash of a 30nm square electron beam, when the beam is in position A of FIG. 9, usingthe patterned beam-defining aperture 212 of FIG. 8A.

FIG. 19 shows a calculated exposure dose due to a single flash of an ˜80nm square electron beam, when the beam is in position A of FIG. 9, usingthe patterned beam-defining aperture 212 of FIG. 8A.

FIG. 20 shows a calculated exposure dose due to a single flash of a 120nm square electron beam, when the beam is in position A of FIG. 9, usingthe patterned beam-defining aperture 212 of FIG. 8A.

FIG. 21A is a graph of the source lens and main lens focusing voltagesagainst the desired square beam size.

FIG. 21B is a graph of the tip half-angle and the beam current at thewafer against the desired square beam size.

FIG. 21C is a graph of the beam flash time and the assumed exposurecurrent density (assuming a 5 μC/cm² resist sensitivity) at the waferagainst the desired square beam size.

FIG. 21D is a graph of the magnification of the virtual source at thewafer surface against the desired square beam size.

FIG. 22 is a diagram of a beam-blanking strategy, which can be used tovary the exposure dose on a subfield basis in order to implementproximity effect correction.

FIG. 23 is a cross-sectional close-up side view of the main lensillustrating the calculated set-up for the focus-1 and focus-2 octupolevoltages.

FIG. 24 is a diagrammatic illustration of one embodiment of the waferstage and position sensors.

FIG. 25 is a schematic diagram of an embodiment of the optical columnand its control electronics.

FIG. 26 is a schematic diagram of one embodiment of the data path andsystem control electronics.

FIG. 27A is a diagram showing how the column writing area can be brokendown into 50 μm-wide stripes, each of which is subsequently subdividedinto 2 μm-square subfields having a 1 nm X-Y address grid.

FIG. 27B is an illustration of an embodiment of the method for writing50 μm-wide stripes simultaneously with a large number of columnspositioned in an X-Y array.

FIG. 27C is a diagram showing an example of the correspondence betweenthe die arrangement on a typical 300 mm wafer and the column X-Y array.

FIG. 28A is a diagram of integrated circuit (IC) pattern data brokendown into 2 μm-square subfields having a 1 nm X-Y address grid.

FIG. 28B is a diagrammatic representation of an example of a subfieldheader data format.

FIG. 28C is a diagrammatic representation of examples of pattern dataformats for writing a single flash and multiple flashes.

FIG. 28D is a diagrammatic representation of examples of pattern dataformats for writing a single line and a polyline.

FIG. 28E is a diagrammatic representation of examples of pattern dataformats for writing an entire subfield, a rectangle or a triangle in theupper right quadrant.

FIG. 28F shows an illustrative example of a typical subfield containingmultiple written pattern types.

FIG. 29A shows a diagrammatic representation of the first step in theproximity effect correction (PEC) scheme, where the fractions written ineach subfield are calculated.

FIG. 29B shows a diagrammatic representation of the second step in thePEC scheme, where the total backscattered electron (BSE) dose for eachsubfield is calculated, assuming no PEC corrections to the primary beamdoses.

FIG. 29C shows a diagrammatic representation of the third step in thePEC scheme, where the total dose at each subfield is calculated bycombining the primary beam dose plus the BSE dose.

FIG. 30 is a graph of calculated throughput against the average numberof flashes per subfield for one lithographic module having variousnumbers of columns from 6×6 up to 10×10, assuming a required exposurecurrent of 3000 A/cm².

DETAILED DESCRIPTION

This invention will be discussed in detail using its implementation inthe field of electron beam lithography as an illustrative example.However, many other fields of use are envisaged, as outlined immediatelybelow.

Scanning electron microscopy typically utilizes a roughly Gaussian beamin order to maximize the beam current density, thereby minimizingimaging time and/or maximizing the image signal-to-noise ratio. Thedisadvantage of using a Gaussian beam for microscopy is the long currenttails extending away from the center of the beam which tend to reducethe achievable image contrast. The present invention has potential usesin scanning electron microscopy to reduce the extent of these currenttails, thus improving image contrast. These same considerations wouldapply to many types of scanned electron beam imaging and analysis tools,such as Scanning Auger Microscopes, Scanning Electron Microscopes,Scanning Transmission Electron Microscopes, etc.

The present invention also has potential applications in the fields ofsemiconductor metrology and inspection. For these applications, roughlyGaussian beams are used to maximize metrology and inspection throughputsby minimizing the times required to measure or inspect features onsemiconductor wafers or masks and reticles. Elimination of the longcurrent tails of the Gaussian distribution will improve the imagingcontrast in these systems. Conversely, if the contrast were keptconstant, the present invention would allow faster pixel dataacquisition and thus improved throughputs.

The patterned beam-defining aperture of the present invention may alsobe used in other types of particle beam systems, utilizing ions, forexample. One example is focused ion beam systems for maskless ionimplantation. In these systems, the ion beam is composed of the desiredimplant ions (e.g., boron, arsenic, phosphorus, etc.) and the reductionof extraneous current tails would reduce the implantation of ionsoutside the region where doping is needed. Another example is focusedion beam direct-write lithography tools, where the ion beam is used toexpose resist similarly to the case for electron beam direct-writesystems. Reduction of extraneous current will improve the contrast inthe lithography process, thereby increasing the process latitude forresist development. Still another example would be scanning secondaryion mass spectrometry (SIMS) systems, where the focused ion beambombards a specimen surface, thereby inducing the emission of secondaryions characteristic of the chemical composition of the material.Reduction of extraneous ions would improve the contrast and resolutionof SIMS images and mass spectra, since the secondary ions would beproduced almost entirely from the region of interest with littleproduction outside this region since the ion tails of the primary ionbeam are greatly reduced.

FIG. 1 illustrates a multi-step method for designing an electron opticalcolumn employing a patterned beam-defining aperture, for use ingenerating a high current-density shaped electron beam. In this example,a square beam is desired at the wafer, although a wide range of beamshapes may be realized with proper selection of the beam-definingaperture pattern.

In Block 102, the initial data concerning the integrated circuit (IC)patterns to be written is defined, including the critical dimension (CD)for the pattern, the IC X-Y dimensions, the X-Y layout of ICs on thewafer, and other data as required.

In Block 103, the initial data concerning the system operatingparameters is defined, including the desired writing throughput(typically in wafers/hour), the resist sensitivity to the writing beam(typically in μC/cm²), the desired writing beam energy at the wafer, thewriting overheads (such as the wafer transfer time, alignment time,etc.), and other parameters as required.

In block 104, from the pattern and writing specifications in blocks 102and 103, the optimum patterned beam shape and size are determined, alongwith the required beam current density. For example, if a pattern CD of45 nm was specified in block 102, a 40 nm square beam profile might beappropriate. If the resist sensitivity is 5 μC/cm², a beam currentdensity of 3000 A/cm² might be necessary to achieve the desired writingthroughput.

Next, in block 106, electron optical design calculations would typicallybe performed to develop the design of the column, including lenselectrode bores, thicknesses, positions and voltages, and the diameterof a circular beam at the wafer which is larger than the size of thefinal patterned beam determined in block 104. For example, if a 40 nmsquare beam were desired, a circular beam of diameter ≧√2×40 nm≈56 nmwould be required—this beam diameter will then allow a square beam 40nm×40 nm to be obtained in block 110 without rounding of the corners.FIGS. 2A-3M illustrate a typical electron optical column designdeveloped with the aid of such a process. Alternatively, the parametersof an existing column may be input and then a patterned beam-definingaperture may be designed as described starting in block 108.

Block 108 involves a series of electron optical design calculationsutilizing the column design developed in block 106, wherein the ray (X,Y) locations at the beam-defining aperture 212 (see FIG. 2A) arerecorded along with their end points (X, Y) on the wafer surface 221(see FIG. 2A). Five sets of rays with different (X, Y) locations on thewafer are typically used: 1) on-axis (i.e., at the center of the scan),2) ± a quarter-width of the scan, and 3) ± a half-width of the scan(i.e., at the two ends of the scan farthest off-axis). This data is thenused to determine which rays for each set fall within the desiredpatterned high current-density beam profile and which rays for each setfall outside the desired pattern for each individual (X, Y) location onthe wafer. FIGS. 4A-4C illustrate the segregation of the trajectory dataat the wafer surface 221 into two groups: those within the desiredpattern and those outside. Note that these sets of rays do notnecessarily correspond to exactly the same rays for each of the fivelocations on the wafer, i.e., a ray passing through a particularposition at the beam-defining aperture might fall inside the desiredbeam profile when the beam is positioned on-axis but might fall outsidethe desired beam profile when the beam has been deflected by ± ahalf-width of the scan. In general, FIGS. 4A-4C show that the beam atthe wafer is circular in all three cases shown, with small variations inthe positions of individual rays—this is the result of careful columndesign in block 106, in particular, the design of mainfield deflectorswhich introduce minimal beam aberration and the use of a moving mainlens to nearly eliminate off-axis aberrations over the entire mainfieldscan (±25 μm in this example).

Block 110 performs the next step: to find the intersection of the fivesets of rays from block 108—this intersection corresponds to those raysfalling within the desired patterned high current-density beam for allfive wafer positions. Typically this set of rays is about 10-15% smallerthan any of the original five sets of rays corresponding to each of thefive individual wafer locations in block 108. This process is necessarysince the electron beam 222 strikes the patterned beam-defining aperturebefore it is deflected by the mainfield deflectors 213 and 214, thusexactly the same set of rays is transmitted by the patternedbeam-defining aperture 212 to the wafer surface 221 for all positions ofthe beam 222 on the wafer surface 221.

Block 112 uses the trajectory data from block 110, to develop an ideal(i.e., possibly not physically realizable) aperture design with the goalof transmitting all rays contributing to the desired beam profile andblocking all rays falling outside the desired profile for all fivepositions on the wafer simultaneously (i.e., across the entire scan).FIG. 6A shows the resulting rays at the beam-defining aperture 212 whichshould be transmitted. FIG. 6B shows the resulting rays at thebeam-defining aperture 212 which should be blocked.

In block 114, final changes are made to the patterned beam-definingaperture design to allow for a practical aperture 212 design, asillustrated in FIGS. 7A-8A.

Block 116 then tests the accuracy of the optics and aperture designs bytracing a large number of electron rays through the electron column fromFIG. 2A, using the aperture from FIG. 8A.

Block 118 combines the large number of rays (typically >30000) generatedin block 116 to obtain beam current density profiles such as those shownin FIGS. 10A-12.

Finally, in block 120, graphs of the beam current profile are generated,and can be compared with the corresponding current profiles for Gaussianbeams. The improved edge sharpness of the patterned beam generated by anelectron column employing the present invention can be seen in FIGS.13-15, compared with the Gaussian profile in FIG. 16.

FIG. 2A shows a cross-sectional view of a typical electron opticalcolumn capable of employing the present invention to generate a highcurrent-density patterned electron beam. The view has been expandedalong the Y-axis to allow the beam 222 and various electrodes to be seenmore clearly. This column design is typical of those that would bedeveloped in block 106 of FIG. 1. Components illustrated include: anelectron source tip 201, extraction electrode 202, first source lenselectrode 203, beam-limiting aperture (BLA) 204, second source lenselectrode 205, gun mounting plate 206, upper alignmentdeflector/stigmator 207, accelerating assembly 209, electron beam 222,lower alignment deflector 208, beam-trimming aperture (BTA) 276, upperblanker 277, lower blanker 278, optics mounting plate 210, beam-definingaperture mount 211, patterned beam-defining aperture (PBDA) 212, uppermainfield deflector 213, lower mainfield deflector 214, subfielddeflector/stigmator 215, focus-1 electrode assembly 216, focus-2electrode assembly 217, field-free tube 218, detector assembly 219,voltage contrast plate 220, and substrate 221 being lithographicallypatterned by the electron beam 222. Note that the combination of thefield-free tube 218, detector assembly 219 and voltage contrast plate220 is referred to as the detector optics and, in the case of electronbeam lithography, is used to image alignment marks on the substrate. Thecombination of the focus-1 electrode assembly 216, focus-2 electrodeassembly 217 and the field-free tube 218 is referred to as the mainlens.

Electrons are emitted from the source tip 201 under the influence of ahigh electric field induced by a voltage difference (typically 2500-3500V) between the source tip 201 and the extraction electrode 202. Theportion of these electrons near the symmetry axis of the optics systempasses through a hole in electrode 202, moving towards first source lenselectrode 203. A beam-limiting aperture 204 is mounted within the boreof electrode 203, which allows only those electrons within a small angle(typically ˜2.0° half-angle) to pass down into the optical column. Avoltage typically from 430 to 640 V (relative to the source tip 201 at 0V) is applied to both electrode 203 and the beam-limiting aperture204—this potential, in combination with roughly 510 V applied to thesecond focusing electrode 205, forms a decelerating lens which focusesthe beam 222 into a parallel beam which passes through the gun mountingplate 206. Upper alignment deflector/stigmator 207 and lower alignmentdeflector 208 are used to steer the electron beam 222 through thebeam-trimming aperture 276 parallel to the optical (Z-) axis. Theaccelerating region 209 between the upper alignment deflector/stigmator207 and the lower alignment deflector 208 raises the beam energy from510 eV up to 5000 eV. The beam 222 then passes through the upper blanker277 and lower blanker 278. Some rays within electron beam 222 arestopped by the patterned beam-defining aperture 212, supported in abeam-defining aperture mount 211, while others pass through to themainfield deflectors 213 and 214, subfield deflector/stigmator 215, andthen enter the main lens. The main lens focuses beam 222 onto thesubstrate surface 221. (Further description of a similar electronoptical column design is provided in U.S. Pat. No. 6,734,428 B2,incorporated herein by reference.)

The column design shown is for illustrative purposes only—the patternedbeam-defining apertures generated by the method of the present inventionmay be employed in a large number of column designs familiar to thoseskilled in the art.

FIG. 2B shows a cross-sectional view of the bottom of a typical electronoptical column capable of employing the present invention to generate ahigh current-density patterned electron beam. Components illustratedinclude: the beam-defining aperture mount 211, patterned beam-definingaperture 212, upper mainfield deflector 213, lower mainfield deflector214, subfield deflector/stigmator 215, focus-1 electrode assembly 216,focus-1 support electrode 230, focus-1 octupole electrodes 231-238,focus-2 electrode assembly 217, focus-2 support electrode 240, focus-2octupole electrodes 241-248, field-free tube 218, detector assembly 219,voltage contrast plate 220, and substrate 221 being lithographicallypatterned by the electron beam 222 which strikes the substrate surface221 at location 250.

The electron rays shown in all figures are calculated using SIMION 3D,ver. 6.0 (a charged particle ray tracing program developed by David Dahlat the Idaho National Engineering and Environmental Laboratory).

FIG. 3A is a pair of views of the rays leaving the source tip 201,showing how the initial distribution of rays is “laminar”, i.e., therays have a uniform distribution spreading out from the tip 201 withoutcrossing over each other. View (a) is a side cross-sectional view of thesource tip 201, extraction electrode 202, first source lens electrode203, beam-limiting aperture 204 and beam 222, showing beam half-anglesout to 30° emerging from the source tip 201. An axial cross-section ofthe beam 222 is taken at location 301. The optical axis is parallel tothe Z-axis 310 and perpendicular to the Y-axis 320.

An axial cross-section of the beam 222 at location 301 is shown in (b),including ray intercepts 302. The X-axis 319 and Y-axis 320 are bothperpendicular to the optical axis 310. Each of the ray intercepts 302can be seen to be evenly separated on a grid corresponding to the X-axis319 and Y-axis 320. The rays in beam 222 preserve this laminar flowbehavior almost all the way to the substrate surface 221.

The design method described herein for the patterned beam-definingaperture 212 relies on the assumption that each ray represents awell-defined amount of current. The calculation for this current is asfollows:

I_(s) = source angular intensity over the emission solid angle used toilluminate the patterned beam-defining aperture 212 (typically 0.4° to1.5° half-angle, in this example 0.8° - usually I_(s) ranges from 100μA/sr up to more than 500 μA/sr). δ = angular increment between rays 302along the X-axis 319 and Y-axis 320 (typically 0.04° to 0.15°, in thisexample, δ = 0.08°). ω = solid angle subtended by each ray 302, for δ =0.08°, = [δ (π/180°)]² = 1.95 ×10⁻⁶ sr I_(ray 302) = I_(s) ω = (500μA/sr) (1.95 × 10⁻⁶ sr) = 0.98 nA for each ray 302.Implicit in this calculation is the assumption that the angularintensity is uniform over the angular range of emission used to generatethe square beam (comprising rays 306 in FIG. 3G) which illuminates thepatterned beam-defining aperture 212. In the example of a Schottkythermal field emitter, this assumption is valid, since typically theangular intensity is very uniform over the central (i.e., on-axis) partof the angular emission distribution. With electron sources for whichthis assumption is invalid, the method described herein for design ofthe patterned beam-defining aperture could be modified to take intoaccount different values for I_(ray 302) depending on the initial angleof each ray 302 at the source tip 201.

FIG. 3B is a pair of views of the rays at the upper alignmentdeflector/stigmator 207. View (a) is a side cross-sectional view of thegun mounting plate 206, upper alignment deflector/stigmator 207 and beam222.

An axial cross-section of the beam 222 at location 303 is shown in (b).The beam 222 is centered within the upper alignment deflector/stigmator207. The eight octupole electrodes 260-267 of the upper alignmentdeflector/stigmator 207 are shown. Voltages may be applied to the eightelectrodes 260-267 to generate a rotatable dipole electric field todeflect the beam 222. Additionally, voltages may be applied to the eightelectrodes 260-267 to generate a rotatable quadrupole field to stigmatethe beam 222 in the upper column. Ray intercepts 304 correspond toelectrons leaving the source tip 201 at the mean energy. Each of the rayintercepts 304 can be seen to be evenly separated on a gridapproximately corresponding to the X-axis 319 and Y-axis 320, withalmost the same relative positions to each other that the correspondingray intercepts 302 in FIG. 3A maintained.

FIG. 3C is a pair of views of the rays at the lower alignment deflector208. View (a) is a side cross-sectional view of the lower alignmentdeflector 208, beam-trimming aperture 276, upper blanker 277 and beam222. An axial cross-section of the beam 222 at location 398 is shown in(b). The beam 222 is centered within the lower alignment deflector 208.The eight octupole electrodes 268-275 of the lower alignment deflector208 are shown. Voltages may be applied to the eight electrodes 268-275to generate a rotatable dipole electric field to deflect the beam 222.Ray intercepts 399 correspond to electrons leaving the source tip 201 atthe mean energy. Each of the ray intercepts 399 can be seen to be evenlyseparated on a grid approximately corresponding to the X-axis 319 andY-axis 320, with almost the same relative positions to each other thatthe corresponding ray intercepts 302 in FIG. 3A maintained.

FIG. 3D is a pair of views of the rays just above the beam-trimmingaperture 276, showing how the initial laminar distribution of anglesshown in FIGS. 3A-3B has been approximately preserved farther down thecolumn. View (a) shows the beam 222 just above the beam-trimmingaperture 276 for the case of a 30 nm beam at the wafer 221, where thevoltage applied to the first source-lens electrode 203 and beam-limitingaperture 204 would typically be around 640V. In this case, the outerrays in beam 222 correspond to the maximum 2.0° half-angle transmittedby the beam-limiting aperture 204, and only rays within the centersquare (corresponding to angles within ±0.45° half-angle at the sourcetip 201 along the X-axis 319 and Y-axis 320) are transmitted fartherdown the column. Rays outside the center square are blocked by thebeam-trimming aperture 276. The beam trimming aperture is square tocreate a square beam cross-section at the patterned beam-definingaperture 212—this is necessary for the proper control of dose within thepatterned beam at the wafer surface 221, as described in more detailbelow.

View (b) in FIG. 3D shows the beam 222 just above the beam-trimmingaperture 276 for the case of a 120 nm beam at the wafer 221, where thevoltage applied to the first source-lens electrode 203 and beam-limitingaperture 204 would typically be around 430 V. The outer rays in beam 222correspond to the maximum 2.0° half-angle transmitted by thebeam-limiting aperture 204, and only rays within the center square(corresponding to angles within ±1.5° half-angle at the source tip 201along the X-axis 319 and Y-axis 320) are transmitted farther down thecolumn.

FIG. 3E is a pair of views of the column near and within the beamblanker. View (a) is a side cross-sectional view of the lower alignmentdeflector 208, beam-trimming aperture 276, upper blanker 277, lowerblanker 278, optics mounting plate 210, beam-defining aperture mount211, patterned beam-defining aperture 212 and beam 222. An axialcross-section of the beam 222 at location 395, at the center of theupper blanker 277, is shown in (b). Ray intercepts 394 correspond toelectrons leaving the source tip 201 at the mean energy. Each of the rayintercepts 394 can be seen to be evenly separated on a gridapproximately corresponding to the X-axis 319 and Y-axis 320, withroughly the same relative positions to each other that the correspondingray intercepts 302 in FIG. 3A maintained. To blank the beam 222,voltages typically in the range ±1.7 V+5000 V are applied to blankerplates 280 and 282. The 3.4 V difference between plates 280 and 282generates a transverse electric field parallel to the Y-axis 320 whichbends the electron beam 222 away from the optical (Z-) axis 310 as shownin FIG. 3E (a). Plates 281 are kept at the common mode voltage of 5000 Vat all times in order to ensure a uniform electric field in the gapbetween plates 280 and 282.

FIG. 3F shows an axial cross-section of the beam 222 at location 393, atthe center of the lower blanker 278. Ray intercepts 392 correspond toelectrons leaving the source tip 201 at the mean energy. Each of the rayintercepts 392 can be seen to be evenly separated on a gridapproximately corresponding to the X-axis 319 and Y-axis 320, withroughly the same relative positions to each other that the correspondingray intercepts 302 in FIG. 3A maintained. To blank the beam 222,voltages typically in the range ±1.54 V+5000 V are applied to blankerplates 283 and 285. The 3.08 V difference between plates 283 and 285generates a transverse electric field parallel to the Y-axis 320 andopposite in direction from the field in the upper blanker 277, whichbends the electron beam 222 back towards the optical (Z-) axis 310 asshown in FIG. 3E (a). Plates 284 are kept at the common mode voltage of5000 V at all times in order to ensure a uniform electric field in thegap between plates 283 and 285. The combined deflection effect of theupper 277 and lower 278 blankers is to deflect the beam 222 off-axis andtowards the patterned beam-defining aperture 212 in such a way that thebeam still appears to come from the virtual source location on theoptical (Z-) axis—this ensures conjugate blanking even though there isno actual cross-over in the column between the source tip 201 and thewafer surface 221. The benefit of avoiding an intermediate cross-over isthat the larger diameter of beam 222 down the column greatly reducescoulomb (space-charge) beam spreading, thus improving the beam edgesharpness at the wafer surface 221.

FIG. 3G (a), shows a pair of beams 222 just above the beam-definingaperture 212, illustrating how the initial laminar distribution ofangles shown in FIGS. 3A-3B has been approximately preserved fartherdown the column. The upper square beam 305 corresponds to the blankedbeam shown in FIG. 3E (a)—it has been deflected completely away from theopening in the patterned beam defining aperture 212, thus no rays aretransmitted to the wafer surface 221. Rays 306 are shown in the lower(unblanked) square beam. Those rays passing through the openings in thepatterned beam-defining aperture 212 are then transmitted to the wafersurface 221 to form a high current-density square beam at location 250of FIG. 2B.

The purpose for the square beam-trimming aperture 276 can be seen inFIG. 3G: in order to minimize the blanking time, it is necessary to keepthe beam size at the patterned beam-defining aperture 212 as small aspossible. It is also necessary that the beam have a squarecross-section, so that as the beam is swept across the patternedbeam-defining aperture (PBDA) 212 (see FIG. 22), each location on theopenings in the PBDA 212 will be illuminated for the same amount oftime. This is only possible if the beam cross-section is square. For allpossible beam sizes at the wafer surface 221, the square illuminatingbeam at the PBDA 212 will be roughly the size shown in FIG. 3G, views(a)-(b), even though the outer beam diameters (corresponding to 2°half-angle at the tip 201) shown in FIG. 3D, views (a)-(b), vary widelyin size. Without the beam-trimming aperture 276, the beam diametersilluminating the PBDA 212 would exhibit a similar wide range in size,causing blanking times to be much longer for smaller beam sizes at thewafer surface 221.

View (b) is a close-up of the beam 222 cross-section at the patternedbeam-defining aperture (PBDA) 212 the case of a 30 nm square beam at thewafer surface 221. For larger beam sizes of 40 nm to 120 nm at the wafer221, the square beam at the PBDA 212 will be slightly smaller than inview (b)—thus for square beams from 30 nm to 120 nm, the beam-trimmingaperture 276 maintains the square beam at the PBDA 212 at approximatelythe optimal (minimum) size for maximum bandwidth blanking.

FIG. 3H (a) is a view of the rays 330 at the center of the uppermainfield deflector 213. The initial laminar distribution of anglesshown in FIGS. 3A-3B has been approximately preserved farther down thecolumn. Note that now the beam cross-section preserves an image of theopenings in the patterned beam-defining aperture 212.

The purpose of the mainfield deflector, comprising 213 and 214, is thefollowing:

-   -   (1) to compensate for small (˜±2 μm) wafer stage positional        errors in both the X-axis 319 and the Y-axis 320.    -   (2) to correct for small (˜±2 μm) mechanical errors in the        column positions in both the X-axis 319 and the Y-axis 320.    -   (3) to position the beam at the center of the particular        subfield to be written along the X-axis 319 only (deflections up        to at least ±25 μm).        All of these requirements are relatively low-bandwidth, but        require that the mainfield deflector induce almost no aberration        in the beam, even with large (e.g., ±25 μm) off-axis deflections        along the X-axis 319. Since the Y-axis 320 deflections are        smaller, a deflector design optimized for large X-deflections        and smaller Y-deflections is used for both the upper 213 and        lower 214 mainfield deflectors as shown. Typical upper mainfield        deflector 213 voltages for the case of maximum X-axis 319        deflection would be (with a 5000 V common mode voltage):

Electrode Voltage 4001 5000 + 2.92 4002 5000 + 2.92 4003 5000 + 2.924004 5000 + 2.92 4005 5000 + 2.92 4006 5000 + 2.92 4007 5000 + 2.92 40085000 + 2.92 4009 5000 + 2.92 4010 5000 + 0.97 4011 5000 − 0.97 4012 5000− 2.92 4013 5000 − 2.92 4014 5000 − 2.92 4015 5000 − 2.92 4016 5000 −2.92 4017 5000 − 2.92 4018 5000 − 2.92 4019 5000 − 2.92 4020 5000 − 2.924021 5000 − 0.97 4022 5000 + 0.97For this example, electrodes 4001-4009 and electrodes 4012-4020 act astwo parallel plates with electrodes 4010, 4011, 4021 and 4022 acting topreserve the uniform X-direction electric field needed for minimaldeflection aberrations. A set of electrostatic equipotential lines 4025is shown, in steps of 0.5 V between 4997.5 V and 5002.5 V—note the highdegree of uniformity in the electric field, which minimizes deflectionaberrations. In the case of pure Y-axis 320 deflection, electrodes4009-4012 and 4001, 4020-4022 act as two parallel plates with electrodes4002-4008 and 4013-4019 acting to preserve the uniform Y-directionelectric field. Because the mainfield deflectors 213 and 214 have beenoptimized for a much larger deflection parallel to the X-axis 319, thedesign of the deflectors 213 and 214 is asymmetrical, having a largerwidth along the Y-axis 320 in order to preserve field uniformity for thehigher X-axis 319 field strengths required for ±25 μm X-deflections. Forthe required ±1 μm Y-deflections, the field strength required is muchlower, so a reduced degree of E-field uniformity is allowable. Aspectsof the design of parallel plate deflectors are well known to thoseskilled in the art.

View (b) shows a possible method for connecting voltages to each of theelectrodes 4001-4022. Electrodes 4004-4006 and 4015-4017 are omitted tosimplify the schematic. Each pair of neighboring electrodes is connectedby a resistor 4035 of value R. These resistors form four linear voltagedividers between drive signals V_(+X+Y) 4031, V_(−X+Y) 4032, V_(−X−Y)4033 and V_(+X−Y) 4034 as shown. Thus, only four drive voltages arerequired to control the twenty-two electrodes 4001-4022. The value R ofresistors 4035 must be kept low enough so that there is minimal RC timedelay between the four drive signals 4031-4034 and the inner electrodessuch as 4004-4006 and 4015-4017, however, the value of R must not be solow that there is excessive power dissipation (which goes as V²/R whereV=the deflection voltage). To minimize the capacitance C on theconnections to electrodes 4001-4022, it is desirable for the resistors4035 to be mounted as close to the column assembly as possible, probablywithin the vacuum enclosure; however, in the vacuum enclosure heatdissipation is more difficult due to the lack of convective cooling,consequently the power dissipation in the resistors R 4035 must beminimized by making R as large as possible while avoiding excessive RCdelays.

FIG. 3I is a view of the rays 331 at the center of the lower mainfielddeflector 214. The initial laminar distribution of angles shown in FIGS.3A-3B has been approximately preserved farther down the column alongwith an image of the openings in the PBDA 212. The differential voltages(ignoring the common mode voltage of 5000 V) on the lower mainfielddeflector 214 electrodes 4101-4122 are always equal in magnitude andopposite in polarity from the voltages on the corresponding electrodes4001-4022 in the upper mainfield deflector 213. A set of electrostaticequipotential lines 4125 is shown, in steps of 0.5 V between 4997.5 Vand 5002.5 V. The X-axis 319 corresponds to the large deflectiondirection for the beam 222, typically at least ±25 μm from the opticalaxis on the wafer surface 221. The direction of stage travel is parallelto the Y-axis 320 (alternatively in the +Y- and −Y-directions with eachsubsequent wafer scan—see FIG. 27B). Typically, the lengths ofelectrodes 4101-4122 along the Z-axis 310 will be the same, and equal tothe lengths of electrodes 4001-4022 in the upper mainfield deflector213. Since the lengths of the upper and lower mainfield deflectors 213and 214 are equal and the applied electrode voltages are equal inmagnitude and opposite in polarity, the combined result is to deflectthe beam 222 off the optical axis 310 and restore it to being parallelto the optical (Z-) axis 310.

FIG. 3J is an axial cross-sectional view of the rays 332 at the centerof the subfield deflector/stigmator 215, showing how the initial laminardistribution of angles shown in FIGS. 3A-3B has been preserved fartherdown the column, along with an image of the openings in the PBDA 212.The subfield deflector/stigmator 215 combines two functions:

-   -   (1) as a deflector (i.e., with a rotatable dipole excitation),        the subfield deflector/stigmator 215 is used to scan the beam        222 by up to ±1 μm in both the X-319 and Y-320 directions to        cover a 2 μm square subfield,    -   (2) as a stigmator (i.e., with a rotatable quadrupole        excitation), the subfield deflector/stigmator 215 corrects for        astigmatism induced by other elements in the optical column.        The beam 222 is off-center within the subfield        deflector/stigmator 215 due to the combined beam deflection in        the upper and lower mainfield deflectors 213 and 214. The        subfield deflector/stigmator 215 electrodes are arranged in a        conventional octupole configuration as shown. Typically, the        lengths of octupole electrodes 223-230 along the Z-axis 310 will        be the same and deflection and stigmation voltages would be        (common mode voltages of 5000 V not shown):

Electrode Electrode Subfield voltages voltages Typicaldeflector/stigmator at +1 μm at +1 μm stigmation 215 electrodesX-deflection Y-deflection voltages Electrode 223 −0.52 V +0.22 V +0.003V Electrode 224 −0.22 V +0.52 V −0.003 V Electrode 225 +0.22 V +0.52 V−0.003 V Electrode 226 +0.52 V +0.22 V +0.003 V Electrode 227 +0.52 V−0.22 V +0.003 V Electrode 228 +0.22 V −0.52 V −0.003 V Electrode 229−0.22 V −0.52 V −0.003 V Electrode 230 −0.52 V −0.22 V +0.003 VFor beam deflections smaller than ±1 μm, the voltages in the table wouldscale linearly. For combined X-Y deflections, the voltages in the middletwo columns would be added linearly with appropriate scaling factors toaccount for the desired X- and Y-deflections as is familiar to thoseskilled in the art. The stigmator voltages tend to vary as the square ofthe off-axis deflection and would be added to the X-Y deflectionvoltages at each respective electrode 223-230.

FIG. 3K is an axial cross-sectional view of the rays 333 inside thefocus-1 electrode assembly 216. The initial laminar distribution ofangles shown in FIGS. 3A-3B has been approximately preserved fartherdown the column along with an image of the openings in the PBDA 212. Thefocus-1 electrode assembly 216 is part of the main lens assemblycomprising electrode assemblies 216, 217 and field-free tube 218. Themain lens assembly is used to focus the beam 222 onto the wafer surface221. The beam 222 is shown off-center (in the +X-direction) within thefocus-1 electrode assembly 216 due to the combined beam deflection inthe upper and lower mainfield deflectors 213 and 214. The focus-1electrode assembly 216 comprises: (1) a support electrode 230 (see FIG.2C) which has a large cylindrical ID, and (2) electrodes 231-238 forminga conventional electrostatic octupole with very short electrode lengthsparallel to the optical (Z-) axis and a smaller ID than the supportelectrode 230. The dipole electrostatic excitation of the octupole231-238 is varied in proportion to the excitation of the upper 213 andlower 214 mainfield deflectors to maintain the effective axis of thefocus-1 electrode assembly 216 concentric with the beam 222.

Typical electrode excitation voltages for a +25 μm X-directiondeflection would be (5000 V common mode voltage is shown):

Electrode Electrode Electrode Focus-1 voltages voltages voltageselectrode with +25 μm with no with −25 μm assembly 216 X-deflectiondeflection X-deflection Electrode 230 5000 V 5000 V 5000 V Electrode 2315000 + 2.22 V 5000 V 5000 − 2.22 V Electrode 232 5000 + 0.92 V 5000 V5000 − 0.92 V Electrode 233 5000 − 0.92 V 5000 V 5000 + 0.92 V Electrode234 5000 − 2.22 V 5000 V 5000 + 2.22 V Electrode 235 5000 − 2.22 V 5000V 5000 + 2.22 V Electrode 236 5000 − 0.92 V 5000 V 5000 + 0.92 VElectrode 237 5000 + 0.92 V 5000 V 5000 − 0.92 V Electrode 238 5000 +2.22 V 5000 V 5000 − 2.22 VThe particular values shown in the table above were determinedtheoretically in a procedure described in FIG. 23.

FIG. 3L is an axial cross-sectional view of the rays 334 inside thefocus-2 electrode assembly 217 (the scale is larger than in FIG. 3K).The initial laminar distribution of angles shown in FIGS. 3A-3B has beenpreserved farther down the column along with an image of the openings inthe PBDA 212. The beam 222 is shown off-center (in the +X-direction)within the focus-2 electrode assembly 217 due to the combined beamdeflection in the upper and lower mainfield deflectors 213 and 214. Withproper setting of the dipole excitation voltages on electrodes 241-248in the focus-2 electrode assembly 217, the X-Y beam position leaving thefocus-2 electrode assembly 217 will be the same as the X-Y beam positionentering the focus-1 electrode assembly 216. The focus-2 electrodeassembly 217 comprises: (1) a support electrode 240 (see FIG. 2C) whichhas a large cylindrical ID, and (2) electrodes 241-248 forming aconventional electrostatic octupole with very short electrode lengthsparallel to the optical (Z-) axis and a smaller ID than the supportelectrode 240. The dipole electrostatic excitation of the octupole241-248 is varied in proportion to the excitation of the upper and lowermainfield deflectors 213 and 214 to maintain the effective axis of thefocus-2 electrode assembly 217 concentric with the beam 222.

The common mode voltage on electrodes 240-248 is determined by thefocusing requirement on-axis for the particular square beam sizedesired. Typical focusing voltages are as follows:

Focus-2 Source Lens Electrodes Beam 222 Square Beam Electrodes 240-248Half-Angle Size 203 and 204 Common Mode at Tip 201  30 nm 638.2 4906.50.4°  40 nm 482.0 5007.4 0.8° ~80 nm 445.3 5122.0 1.2° 120 nm 432.05217.2 1.5°

Typical electrode excitation voltages for a ±25 μm X-directiondeflection would be (5007.4 V common mode voltages shown for a 40 nmbeam):

Electrode Electrode Electrode Focus-2 voltages voltages voltageselectrode with +25 μm with no with −25 μm assembly 217 X-deflectiondeflection X-deflection Electrode 240 5007.4 V 5007.4 V 5007.4 VElectrode 241 5007.4 + 100.00 V 5007.4 V 5007.4 − 100.00 V Electrode 2425007.4 + 41.42 V 5007.4 V 5007.4 − 41.42 V Electrode 243 5007.4 − 41.42V 5007.4 V 5007.4 + 41.42 V Electrode 244 5007.4 − 100.00 V 5007.4 V5007.4 + 100.00 V Electrode 245 5007.4 − 100.00 V 5007.4 V 5007.4 +100.00 V Electrode 246 5007.4 − 41.42 V 5007.4 V 5007.4 + 41.42 VElectrode 247 5007.4 + 41.42 V 5007.4 V 5007.4 − 41.42 V Electrode 2485007.4 + 120.00 V 5007.4 V 5007.4 − 120.00 VThe particular values shown in the table above were determinedtheoretically in a procedure described below in FIG. 23. Each of the rayintercepts 334 in beam 222 is evenly separated on a grid approximatelycorresponding to the X-axis 319 and Y-axis 320, with roughly the samerelative positions to each other that the corresponding ray intercepts302 in FIG. 3A maintained.

FIG. 3M is an axial cross-sectional view of the rays 335 inside thefield-free tube 218. The initial laminar distribution of angles shown inFIGS. 3A-3B has been approximately preserved along with an image of theopenings in the PBDA 212. The beam 222 is shown off-center (in the+X-direction) within the field-free tube 218 due to the combined beamdeflection in the upper and lower mainfield deflectors 213 and 214. Withproper setting of the voltages on electrodes 230-238 in the focus-1electrode assembly 216 and on electrodes 240-248 in the focus-2electrode assembly 217, the X-Y beam position entering the field-freetube 218 will be roughly the same as the X-Y beam position entering thefocus-1 electrode assembly 216. At the entrance to the field-free tube218, there is a diverging accelerating lens arising from penetration ofthe electric field between the focus-2 assembly 217 and the field-freetube 218—this diverging lens increases the beam deflection at the waferby typically 25% over that due to the main deflectors 213 and 214. Notethat now the beam 222 is much smaller in diameter than at the entranceto the focus-1 electrode assembly 216 due to the focusing effect of themain lens.

The use of a “moving lens” as described above has two importantadvantages:

-   -   1) since the beam is always on the symmetry axis of the lens        fields, all off-axis aberrations, both geometrical (coma,        astigmatism, curvature of field and distortion) and chromatic        (variation in magnification) are essentially eliminated    -   2) the beam striking the wafer surface will always be scanned        telecentrically, i.e., perpendicular to the wafer surface,        thereby improving the depth-of-focus.        Considerations on the Location of the Beam-Defining Aperture

The location of the patterned beam-defining aperture 212 in the presentinvention is a key consideration in determining the effectiveness of thebeam patterning process at the substrate surface 221. The followinglocations down the column might be considered:

1. Near the Source Tip 201

FIG. 3A is an illustration of the profile of beam 222 near the sourcetip 201. The evenly-spaced distribution of ray intercepts 302 withinbeam 222 can be seen clearly. At location 301, any effects due tospherical aberration or chromatic aberration are minimal since the beam222 is so near the tip it has had almost no time to diverge from theideal evenly-spaced angular distribution. Spherical aberration will tendto make the outer rays bend back towards the optical (symmetry) axis,which would show up as the outer rays being more closely spaced than theinner rays. Chromatic aberration would tend to radially separate thelower energy electrons from the higher energy electrons. A disadvantageof positioning the beam-defining aperture 212 near the source tip 201 isthat electrons striking the aperture can backscatter and strike thesource tip 201, generating heating and outgassing there.

2. At the Top of the Accelerating Column 209

FIG. 3B shows the beam profile at the top of the accelerating column209. At this location (position 303), the ray intercepts 304 within beam222 are still evenly separated, with spherical and chromatic aberrationdue to the source lens (comprised of electrodes 202, 203, 204 and 205)still minimal.

3. Just Above the Main Deflectors

FIG. 2B shows a third possible location for the patterned beam-definingaperture 212—this is the location chosen for the embodiment describedherein. A key advantage of placing the beam-defining aperture 212 atlocation 3 relates to the optical alignment of the column. By placingthe beam trimming aperture 276 at the bottom of the accelerating column209, it can be used to help set up the excitations of the alignmentdeflectors 207 and 208 in order to steer the beam properly through thepatterned beam-defining aperture 212 and then into the lower parts ofthe column, including the mainfield deflectors 213 and 214, subfielddeflector/stigmator 215, and the main lens. Proper alignment of the beamthrough the main lens is key to obtaining the proper patterned beam atthe substrate surface 221.

Note: the electron beam energy at the point in the column where the beamdefining aperture is placed will be a factor in determining the amountof heating of the aperture that may occur. Aperture heating should beconsidered when determining the location for the beam-defining aperture.Further Considerations Regarding Optimization of the Placement of theBeam-Defining Aperture

An optimization process may be used in which the process shown in FIG. 1is repeated for different positions of the beam-defining aperture in thecolumn. This will generate beam profiles and current densitydistributions at the substrate and beam-defining aperture designs foreach position. The best position may then be determined by alsoconsidering:

a) the beam profile at the substrate.

b) the beam current density at the substrate.

c) the manufacturability of the beam-defining aperture.

FIG. 4A shows a calculated circular beam profile at the surface ofsubstrate 221 centered on the optical axis, typical of those generatedin block 108 of FIG. 1, prior to insertion of a patterned beam-definingaperture 212 into the column from FIG. 2A. The beam 222 cross-section isgraphed relative to the two axes, X 401 and Y 402. The desired patternedbeam shape 403, shown as a square here, but which can have anypracticable shape, is then superimposed on the beam cross-section. Rays404 fall outside the desired shape 403, while rays 405 fall inside thedesired shape 403. For each of the rays 404 and 405, the X-Y coordinatesat the beam-defining aperture 212 are recorded, along with thecorresponding X-Y coordinates at the wafer surface 221 shown here.

Note that the calculations in block 108 of FIG. 1 have adjusted thediameter of the circular beam to just enclose the desired beam pattern403 with very few rays lost at the corners of the (square) pattern 403shown. This ensures the highest efficiency in the use of the emissioncurrent from the source tip 201, thus maximizing the current density inthe beam 222 at the substrate 221. In the example shown, the desiredbeam pattern 403 is a 40 nm square and the circular beam diameter hasbeen adjusted to be a little larger than √2×40 nm≈56 nm, correspondingto the distance between the diagonal corners of the square beam pattern403.

FIG. 4B shows a calculated circular beam profile at the surface ofsubstrate 221 centered +12.5 μm off the optical (Z-) axis, typical ofthose generated in block 108 of FIG. 1, prior to insertion of apatterned beam-defining aperture 212 into the column from FIG. 2A. Thebeam 222 cross-section is graphed relative to the two axes, X 406 and Y402—note that the same Y-axis 402 is used as in FIG. 4A but due to the+12.5 μm X-deflection, a different X-axis 406 is defined with X=0 onX-axis 406 corresponding to X=+12.5 μm on X-axis 401. The desiredpatterned beam shape 403, shown as a square here is the same as in FIG.4A. Rays 407 fall outside the desired shape 403, while rays 408 fallinside the desired shape 403. For each of the rays 407 and 408, the X-Ycoordinates at the beam-defining aperture 212 are recorded, along withthe corresponding X-Y coordinates at the wafer surface 221 shown here.

Note that the design of the optical column must ensure that the beamremains circular with approximately the same diameter, even whendeflected +12.5 μm off-axis as shown. This is important for achievingthe same beam size and current density when deflected off-axis as whenthe beam is near the optical axis. It is also important to note that theset of rays 408 falling inside the desired pattern 403 shown here do notnecessarily correspond to the set of rays 405 falling inside the desiredpattern 403 in FIG. 4A. This is due to off-axis geometrical aberrationsin the optical column.

FIG. 4C shows a calculated circular beam profile at the surface ofsubstrate 221 centered +25 μm off the optical (Z-) axis, typical ofthose generated in block 108 of FIG. 1, prior to insertion of apatterned beam-defining aperture 212 into the column from FIG. 2A. Thebeam 222 cross-section is graphed relative to the two axes, X 409 and Y402—note that the same Y-axis 402 is used as in FIGS. 4A and 4B, but dueto the +25 μm X-deflection, a different X-axis 409 is defined with X=0on X-axis 409 corresponding to X=+25 μm on X-axis 401. The desiredpatterned beam shape 403, shown as a square here, is the same as inFIGS. 4A and 4B. Rays 410 fall outside the desired shape 403, while rays411 fall inside the desired shape 403. For each of the rays 410 and 411,the X-Y coordinates at the beam-defining aperture 212 are recorded,along with the corresponding X-Y coordinates at the wafer surface 221shown here.

Note that the design of the optical column must ensure that the beamremains circular with approximately the same diameter, even whendeflected +25 μm off-axis as shown. This is important for achieving thesame beam size and current density when deflecting the maximum distanceoff-axis as when the beam is near the optical (Z-) axis. It is alsoimportant to note that the set of rays 411 falling inside the desiredpattern 403 shown in FIG. 4A do not necessarily correspond to the set ofrays 405 falling inside the desired pattern 403 in FIG. 4A or to the setof rays 408 falling inside the desired pattern 403 in FIG. 4B. This isdue to off-axis geometrical aberrations in the optical column.

FIG. 5 shows a calculated square beam profile at the surface ofsubstrate 221 centered on the optical axis, typical of those generatedin blocks 108-110 after insertion of a patterned beam-defining aperture212 into the column from FIG. 2A. The beam 222 cross-section is graphedrelative to the two axes, X 401 and Y 402, the same as in FIG. 4A. Allthe rays 505 fall within the desired patterned beam shape 403 shown inFIG. 4A.

Note that the calculations in block 110 have determined the intersectionof the five sets of rays:

-   -   1) the set of rays 405 in FIG. 4A (corresponding to no        deflection)    -   2) the set of rays 408 in FIG. 4B (corresponding to a +12.5 μm        X-deflection)    -   3) the set of rays 411 in FIG. 4C (corresponding to a +25 μm        X-deflection)    -   4) the set of rays 408 in FIG. 4B mirror-imaged around the        Y-axis (X-coordinates inverted) at the wafer surface 221 (this        generates data corresponding to a −12.5 μm X-deflection—note        that this also mirror-images the rays at the beam-defining        aperture 212)    -   5) the set of rays 411 in FIG. 4C mirror-imaged around the        Y-axis (X-coordinates inverted) at the wafer surface 221 (this        generates data corresponding to a −25 μm X-deflection).        The intersection of these five sets is typically 5-10% smaller        than any of the five individual sets. This is due to off-axis        geometrical aberrations distorting the original circular beam        profiles. The goal of the optical design process in block 108 of        FIG. 1 is to minimize off-axis geometrical aberrations and thus        maximize the size of the intersection of the above five sets of        rays. The set of rays 505 shown in FIG. 5 is a subset of the set        of rays 405 in FIG. 4A as a result of this effect. In this        particular example, the set of rays 405 has 237 members while        the set of rays 505 has 223 members, for a reduction of 5.9%.

FIG. 6A is a graph of the idealized set of rays 605, 606 and 607 at thepatterned beam-defining aperture 212 which should be transmitted to thewafer, corresponding to rays 505 in FIG. 5. This is the result of theideal aperture design developed in block 112 of FIG. 1. The center setof rays 605 within the area having X-Y coordinates satisfying −40μm<X<+40 μm and −40 μm<Y<+40 μm corresponds to those rays which undergominimal spherical aberrations since they correspond to small anglesrelative to the optical axis at the source tip 201. The outer sets ofrays 606 for which X<−40 μm, X>+40 μm, Y<−40 μm and/or Y>+40 μmcorrespond to rays undergoing larger spherical aberration which causesthem to “fold” over into the desired beam profile 403 even though infirst-order optics they would fall outside the desired beam profile 403.Note that parallel to the Y-axis 602 there are two holes 603 in thedistribution of rays. Parallel to the X-axis 601 there are another twoholes 604 in the ray distributions. These four holes 603 and 604correspond to rays (such as 404, 407, or 410) which would fall outsidethe desired beam profile 403. Along the diagonals to the Y-axis 602 andX-axis 601, all rays are transmitted—this is a result of the carefulmatching of the original (circular) beam profile to the desired size ofthe beam shape 403 along its diagonal dimension. Holes 603 and 604correspond to areas of the patterned beam-defining aperture 212 whichare opaque to the beam 222, i.e., solid patterns. As can be seen in FIG.6A, however, these solid patterns are separated from the outside of thebeam-defining aperture 212 and are thus not physically realizable. Rays607 correspond to those rays which must be sacrificed in order toachieve a practical aperture design as shown in FIG. 8A.

FIG. 6B is a graph of the idealized set of rays 610 and 611 which shouldbe blocked by the beam-defining aperture 212 so that they will not reachthe wafer surface 221. This set of rays is complementary to the setshown in FIG. 6A and is the result of the ideal aperture designdeveloped in block 112 of FIG. 1. The set of rays 610 corresponds tothose rays which must be blocked to generate the desired square beamprofile 403—these rays 610 correspond to holes 603 and 604 in FIG. 6A.Along the diagonals to the X- and Y-axes, no rays are blocked—this is aresult of the careful matching of the original (circular) beam profileto the desired size of the beam shape 403 along its diagonal dimension.Rays 611 around the perimeter result from the fact that the initial(circular) beam profile was slightly larger that the diagonal dimensionof the desired beam shape 403—this is desirable since otherwise clippingof the corners of the actual beam profile might occur.

FIG. 7A is a graph of the actual set of rays which are transmitted tothe wafer by the practical aperture design shown in FIG. 8A which wasdeveloped in block 114 of FIG. 1. The only change to the transmittedrays between FIG. 6A and FIG. 7A is at locations 701, where now thereare no transmitted rays. This corresponds to the loss of the six rays607 in FIG. 6A.

FIG. 7B is a graph of the actual set of rays which are blocked by theaperture design shown in FIG. 8A. This set of rays is complementary tothe set shown in FIG. 7A. The only change to the blocked rays betweenFIG. 6B and FIG. 7B is at locations 702, where now there are sixadditional blocked rays, corresponding to rays 701 missing from FIG. 7A.

FIG. 8A shows the results of the final changes to the aperture designmade in block 114 of FIG. 1 to obtain a practical patternedbeam-defining aperture 212 design. Ray intercepts 605 and 606 correspondto FIGS. 6A and 7A, while struts 812 correspond to the added aperturematerial needed to support the four center structures 805 which blockrays corresponding to ray intercepts 610. Various radii 803 are added tothe aperture design for added strength and ease of fabrication—the sizeof these radii should be kept to the minimum required, however, to avoidblocking too much beam current. The design is not four-fold symmetricbecause of the fact that the mainfield deflection is always parallel tothe X-axis 601, with only a small (±1 μm) deflection parallel to theY-axis 602. This non four-fold symmetry is principally apparent with theaddition of two small protrusions 804 within the center square opening.Because the beam deflection around both the X-axis 601 and the Y-axis602 is symmetric, the resulting patterned beam-defining aperture designis mirror-symmetric around both the X-axis 601 and Y-axis 602.

The patterned beam-defining aperture (PBDA) 212 is a conductivestructure, held at a fixed potential. It may be manufactured bymachining, laser ablating, micro-machining, etc. a metal foil, aconductive membrane, a conductively coated membrane, or an equivalentthin material. For applications utilizing the PBDA 212 in a column at aposition where high energy electrons are incident on it, there is theoption to utilize a patterned thick film supported by a continuousmembrane, the continuous membrane being ‘electron transparent’. Thisdesign allows PBDAs to be fabricated without the need for mechanicalsupport struts 812 and radii 803.

Another important consideration is the effects of the energy spread ofthe electron beam 222, which, for example with Schottky emitters, mayexceed 1.0 eV FWHM. The effect of the chromatic aberration in the uppercolumn, i.e., all optical elements above the beam-defining aperture 212,is to blur the beam 222 at the beam-defining aperture 212. In opticaldesigns without an intermediate crossover above the PBDA 212, thisblurring is generally manifested as higher energy electrons beingfarther from the optical axis and lower energy electrons being nearer tothe optical axis. If the chromatic beam blurring is too large, the raysintersecting the patterned beam-defining aperture will not be properlyapertured. FIG. 8A shows the ray intersections with the plane of thebeam-defining aperture 212 corresponding to electrons at the nominalenergy, in this example, 5000 eV.

FIG. 8B illustrates part of the mapping of rays passing through the PBDA212 to the ray intersections at the wafer surface 221. The square beam840 at the wafer surface 221 is shown for rays passing through thecenter (roughly square) opening 860 of PBDA 212. Ray 841 passes throughthe upper right corner of opening 860, landing on the wafer surface 221at the upper right corner of square beam 840. Similarly, ray 845 passesthrough the lower left corner of opening 860, landing on the wafersurface 221 at the lower left corner of square beam 840. The mapping ofrays passing through the center opening in PBDA 212 to the square beam840 follows the same pattern for rays 842-844—this is essentiallyidentical to the way a patterned beam is formed in prior art shaped beamsystems, giving a relatively low current density at the wafer surface221.

The mapping of rays between the PBDA and the wafer shown in FIG. 8B isessentially an image of the center square opening 860 onto the wafersurface 221. In prior art shaped beam systems, the beam shape at thewafer surface 221 is an image of one or more apertures typicallydemagnified onto the wafer surface 221 with a 1:1 mapping of (X, Y)coordinates at the beam-shaping aperture(s) onto the (X, Y) coordinatesat the wafer surface 221. A 1:1 mapping means that for every (X, Y)coordinate at the plane of the PBDA 212, there is exactly one (X, Y)coordinate at the plane of the wafer 221. In order to achieve a 1:1mapping, it is necessary that all aberrations in the optical system beminimized so that imaging is dominated by the first-order optics of thesystem. This limitation affects the total amount of current which can befocused into the beam at the wafer surface 221 since the aberrationsmust be minimized by restricting the range of beam angles at the sourcetip 201 which are transmitted to the wafer surface 221.

However, to form a shaped beam at the wafer surface it is not necessaryto employ such a 1:1 mapping. It is possible to employ an N:1 mapping(where N is an integer, N≧2; in the embodiment of the invention herein,N=3) from the PBDA plane to the wafer plane. In this case, with N=3,there are exactly three different (X, Y) coordinates in the plane of thePBDA 212 which map to essentially every (X, Y) coordinate in the planeof the wafer surface 221. The only exception to this N:1 mapping is at(0, 0)=the center of the beam, but this has no effect on the beam shapesince it is away from the beam edge. Since the illumination of the PBDA212 is uniform, with a 3:1 mapping, a larger current can be focused intothe shaped beam at the wafer surface 221 than is possible with a 1:1mapping. The reason that the mapping in the present invention is 3:1 (asopposed to 2:1, 4:1, . . . ) is that spherical aberration is thedominant aberration on-axis. To preserve the square beam shape off-axis,it is further necessary that the off-axis aberrations be minimized,since otherwise the 3:1 mapping will be degraded, resulting in loss ofthe desired patterned beam shape. In the present invention, a “movinglens” (see FIGS. 3K, 3L) is used to maintain the effective axis of themain lens concentric with the beam for all off-axis beam deflections(see FIG. 23). Since the beam is always on the effective axis of themain lens, all off-axis aberrations (geometrical and chromatic) arenearly eliminated, preserving the dominance of spherical aberration(which is unchanged off-axis).

An N:1 mapping is possible because the individual rays (each rayrepresenting the trajectory of a single electron) can overlap withalmost no interaction between them. Any residual interactions are called“space-charge beam spreading”. For beam currents in the nA range, theseeffects are minimal at the beam energies (50 keV) employed in thepresent invention.

To increase the current density in the shaped beam 840, a set of rays inaddition to rays 841-845 are shown in FIG. 8C, passing through the outeropenings 861 and 862 in PBDA 212. Ray 846 passes through opening 861just outside of the center square opening 860 and lands on the wafersurface 221 at the lower left corner of shaped beam 840. Ray 851 passesthrough opening 861 roughly halfway between the inner and outer edges ofopening 861 and lands on the wafer at the center of shaped beam 840. Ray849, passing near the outer edge of opening 861 lands at the upper rightcorner of shaped beam 840. The mappings of rays 847, 850, and 848,passing through opening 862 are similar, as shown. Note that, unlike thecase for opening 860, rays passing through openings 861 and 862 are“folded over”, with rays passing through openings 861 and 862 farthestfrom the center of PBDA 212 landing the wafer surface 221 at theopposite corners of shaped beam 840. Since the current densityilluminating PBDA 212 is uniform, the total beam current reaching shapedbeam 840 is proportional to the area of openings 860-862. Because thefocusing of rays 841-845 is similar to that used to generate prior artshaped beams, the area of opening 860, compared with the total area ofopenings 860-862 determines the increase in beam current density at thewafer surface 221 obtained through use of the present invention. In theexample of FIGS. 8B-8C, the total area of openings 861 and 862 is about6-7 times the area of opening 860, thus the increase in current densityis about 7-8 times that which would be possible using the center opening860 only.

FIG. 9 shows a diagram of the various beam positions A-D at the wafersurface used for calculation of beam profiles. Using only the subfielddeflector/stigmator 215 (see FIG. 2A), the maximum deflection is ±1 μmin the X-direction 910 and ±1 μm in the Y-direction 911, moving the beam222 from the center position A 901 to position B 902. Using only themainfield deflectors 213 and 214, the maximum deflection shown is ±25 μmin the X-direction 910, moving the beam 222 to position C 903. Usingboth the mainfield deflectors 213 and 214 and the subfielddeflector/stigmator 215 moves the beam to position D 904. A typical 2μm-square subfield 912 is shown, defining the 2 μm 914 width of the scanstripe. While the mainfield deflectors 213 and 214 are moving the beamgenerally along the X-axis 910, the wafer stage is moving in direction915 parallel to the Y-axis 911 in a serpentine pattern illustrated inFIG. 27B.

FIG. 10A shows a calculated exposure dose at position A in FIG. 9 due toa single flash of the square electron beam. Coordinate axes on thesubstrate surface 221 are X 1001 and Y 1002. Area 1004 corresponds tobeam current densities ≧3000 A/cm². In this illustrative example, if theresist sensitivity is assumed to be 5 μC/cm², and the dwell time to be1.67 ns, then:Dose into substrate=(current density)(dwell time)=(3000 A/cm²)(1.67ns)=5 μC/cm²=resist sensitivity.Thus the resist will be fully exposed within area 1004. In region 1003,the exposure dose is <5 μC/cm² and the resist is therefore not fullyexposed. FIG. 10A shows that area 1004 is roughly a 40 nm square. Thecombined effects of the virtual source size, chromatic aberration (toall orders), and spherical aberration (to all orders) are fully takeninto account in this calculation. The beam profile plot in FIG. 13corresponds to the current between the two lines 1005 and 1006, i.e.,the current density across the side of the square beam shape.

FIG. 10B shows a calculated exposure dose at position B in FIG. 9 due toa single flash of the square electron beam. Coordinate axes on thesubstrate surface 221 are X 1011 and Y 1012. Area 1014 corresponds tobeam current densities ≧3000 A/cm², as in FIG. 10A. With a 1.67 ns dwelltime and 5 μC/cm² resist sensitivity, the resist will be fully exposedwithin area 1014. In region 1013, the exposure dose is <5 μC/cm² and theresist is therefore not fully exposed. FIG. 10B shows that area 1014 isagain roughly a 40 nm square, very similar to area 1004. The similaritybetween areas 1004 and 1014 shows that the full +1 μm X and Y subfielddeflections have a minimal effect on the beam shape. The combinedeffects of the virtual source size, chromatic aberration (to allorders), spherical aberration (to all orders) and off-axis aberrations(both geometric and chromatic to all orders) are fully taken intoaccount in this calculation.

FIG. 10C shows a calculated exposure dose at position C in FIG. 9 due toa single flash of the square electron beam. Coordinate axes on thesubstrate surface are X 1021 and Y 1022. Area 1024 corresponds to beamcurrent densities ≧3000 A/cm², as in FIGS. 10A and 10B. With a 1.67 nsdwell time and 5 μC/cm² resist sensitivity, the resist will be fullyexposed within area 1024. In region 1023, the exposure dose is <5 μC/cm²and the resist is therefore not fully exposed. FIG. 10C shows that area1024 is again roughly a 40 nm square, very similar to areas 1004 and1014. Comparison of areas 1004 and 1024 shows that the full +25 μmmainfield deflection has a minimal effect on the beam shape. Thecombined effects of the virtual source size, chromatic aberration (toall orders), spherical aberration (to all orders) and off-axisaberrations (both geometric and chromatic to all orders) are fully takeninto account in this calculation.

FIG. 10D shows a calculated exposure dose at position D in FIG. 9 due toa single flash of the square electron beam. Coordinate axes on thesubstrate surface are X 1031 and Y 1032. Area 1034 corresponds to beamcurrent densities ≧3000 A/cm², as in FIGS. 10A-10C. With a 1.67 ns dwelltime and 5 μC/cm² resist sensitivity, the resist will be fully exposedwithin area 1034. In region 1033, the exposure dose is <5 μC/cm² and theresist is therefore not fully exposed. FIG. 10D shows that area 1034 isagain roughly a 40 nm square, very similar to areas 1004, 1014 and 1024.Comparison of areas 1004 and 1034 shows that the full +25 μm mainfielddeflection combined with the full +1 μm X and Y subfield deflections hasa minimal effect on the beam shape. The combined effects of the virtualsource size, chromatic aberration (to all orders), spherical aberration(to all orders) and off-axis aberrations (both geometric and chromaticto all orders) are fully taken into account in this calculation.

FIG. 11 shows a calculated exposure dose at position A in FIG. 9 due tothree flashes of the square electron beam (as in FIG. 10A) abutting inan “L” pattern with beam center-to-center spacings of 40 nm. Coordinateaxes on the substrate surface are X 1101 and Y 1102. Area 1104corresponds to beam current densities ≧3000 A/cm². With a 1.67 ns dwelltime and 5 μC/cm² resist sensitivity, the resist will be fully exposedwithin area 1104. In region 1103, the exposure dose is <5 μC/cm² and theresist is therefore not fully exposed. Exposed area 1104 is roughly an“L” shape with some radiusing 1105 at the bend of the “L”. The widthacross the arms of the “L” is roughly 40 nm, corresponding to the 40 nmsquare area 1004. FIG. 11 demonstrates that complex patterns may beexposed by abutting the square beams on the substrate surface 221. Thecombined effects of the virtual source size, chromatic aberration (toall orders), and spherical aberration (to all orders) are fully takeninto account in this calculation.

FIG. 12 shows a calculated exposure dose at position A in FIG. 9 due totwo overlapping flashes of the square electron beam and a separatesingle flash (all flashes as in FIG. 10A). Coordinate axes on thesubstrate surface are X 1201 and Y 1202. Areas 1204 and 1205 correspondto beam current densities ≧3000 A/cm². With a 1.67 ns dwell time and 5μC/cm² resist sensitivity, the resist will be fully exposed within areas1204 and 1205. In region 1203, the exposure dose is <5 μC/cm² and theresist is therefore not fully exposed. Exposed region 1204 is the sameas exposed region 1004. Region 1205 corresponds to two flashes of the 40nm square beams from FIG. 10A spaced center-to-center only 30 nm, givinga 10 nm overlap. This overlap causes the central region of area 1205 tobe overexposed, resulting in a 2-3 nm bulge 1206 in the pattern. FIG. 12demonstrates that patterns not corresponding to integral multiples ofthe size of the square beam (40 nm in this case) may be exposed on thesubstrate surface 221 by overlapping the square beams. The combinedeffects of the virtual source size, chromatic aberration (to allorders), and spherical aberration (to all orders) are fully taken intoaccount in this calculation.

FIG. 13 shows a graph of calculated beam current density 1302 atposition A in FIG. 9 across a single square beam (as in FIG. 10A) andacross a single Gaussian beam along the X-axis 1301. The height of theGaussian beam 1304 has been adjusted to give ˜40 nm FWHM at the beamcurrent density 3000 A/cm² (dose=5 μC/cm², assuming 1.67 ns dwell time)as indicated by intersections 1305 with the square beam currentdistribution curve 1303 which is calculated by averaging the currentdensity along the Y-axis between the lines 1005 and 1006 in FIG. 10A.The square beam current density drops from 3000 A/cm² (at intersections1305, ±20 nm from the beam center), to <1000 A/cm² only 5 nm farther out(at ±25 nm) from the beam center.

FIG. 14 shows a graph of the calculated beam current density 1402 atposition A in FIG. 9 across three square beams, abutted with 40 nmcenter-to-center spacings along the X-axis 1401, compared with thecurrent density resulting from three abutted Gaussian beams (all with 40nm FWHM at 3000 A/cm² and 40 nm center-to-center spacings). The Gaussianbeams are adjusted as in FIG. 13 to give intersections 1405 at the beamcurrent density 3000 A/cm² (dose=5 μC/cm², assuming 1.67 ns dwell time).The tails of the three square beam curve 1403 drop off much faster awayfrom the beam edges at −20 nm and +100 nm (=120 nm width=3×40 nm, where40 nm=width of each square beam) than do the tails of the three Gaussianbeam curve 1404. FIG. 14 shows that the steep drop-offs in currentdensity at the edges of the square beams enable these beams to beabutted to produce larger-size features with essentially the samemaximum current density as is found along the edges of single beams.This explains why it is possible to combine beam flashes to createlarger patterns (such as pattern 1104 in FIG. 11), with minimal bulgingdue to the current tails of the individual beam flashes.

FIG. 15 shows a graph of the calculated beam current density 1502 atposition A in FIG. 9 across three square beams, abutted with 40 nmcenter-to-center spacings along the X-axis 1501, showing both theindividual square beam profiles 1503, 1504 and 1505 and the combinedthree-beam profile 1403 from FIG. 14. The relatively flat top of curve1403 (ranging from 6045 A/cm² to 6667 A/cm²) shows how the steep sidesof each square beam profile 1503, 1504 and 1505 add (when offset by 40nm center-to-center spacings) to give a net current density fluctuationless than ±5%.

FIG. 16 shows a graph of calculated beam current density 1602 acrossthree combined Gaussian beams 1404 (from FIG. 14) and three separateGaussian beams 1603, 1604 and 1605, with the beams spaced 40 nmcenter-to-center along the X-axis 1601 and with each separate Gaussianbeam having a 40 nm FWHM at the exposure dose 3000 A/cm² (assuming 1.67ns dwell time and 5 μC/cm² resist sensitivity). The long tails outsideof the desired edges of the exposure area from −20 nm to +100 nm can beseen clearly. These long tails reduce the process latitude required inorder to preserve the desired pattern critical dimension (CD).

Comparison of curve 1403 in FIG. 15, with curve 1404 in FIG. 16 showsthat the combinations of three abutted square beams in FIGS. 15A-Dgenerally demonstrate a more uniform current density across the exposedregions and also much sharper edges (faster drop-offs in currentdensity) leading to greater process latitudes.

FIG. 17A shows a diagram of a possible beam-scanning method for use insetting up the optics to generate an optimized square beam profile. Thedesired square beam profile at location 1701 is over the center surface1723 of a special mask structure which may be included on the waferstage of the system or on a special set-up wafer installed into thesystem. Surface 1713 is configured to give a larger imaging signal whenilluminated by the beam 222 compared with the imaging signal arisingfrom the center surface 1723. This imaging contrast could beaccomplished by connecting surface 1713 to an imaging system, and notconnecting surface 1723 to the imaging system. While the beam 222 is atlocation 1701, the beam current flows into surface 1723 which is notconnected to the imaging system. As the beam 222 is scanned in direction1702 across edge 1710, an increasing portion of the beam current strikesthe surface 1713 which is connected to the imaging system. To avoidcharging effects, current flowing into both surfaces 1713 and 1723 musteventually flow to ground. At location 1703, half the beam current wouldbe collected since the beam is half over the collector area 1713. Notethat as the beam 222 is scanned in direction 1702, the square edges ofthe beam profile are parallel to the edge 1710, thus the signal goesfrom 0% to 100% over a distance equal to the dimension D 1720 of thebeam parallel to the scan direction 1702.

As the beam 222 is scanned in direction 1704 across edge 1711, anincreasing portion of the beam current strikes the surface 1713 and istherefore collected to give an imaging signal. At location 1705, halfthe beam current would be collected since the beam 222 is half over thecollector area 1713. Note that as the beam 222 is scanned in direction1704, the square edges of the beam profile are at 45° angles to the edge1711, thus the signal goes from 0% to 100% over a distance equal to thediagonal dimension √2 D 1722 of the beam parallel to the scan direction1704.

As the beam 222 is scanned in direction 1706, the result will be similarto that described above for scan direction 1702, assuming the beamprofile is square with dimension D 1721 parallel to the scan direction1706. At location 1707, half the beam current would be collected sincethe beam is half over the edge 1712 of area 1713.

An alternative method of generating image contrast would be to fabricateareas 1713 and 1723 from materials having differing secondary electronemission coefficients, thus enabling the use of the detector optics ofFIG. 2A. Methods of imaging in electron beam systems are well known tothose skilled in the art.

FIG. 17B shows calculated line scans for scan directions 1702 and 1704of FIG. 17A, illustrating a potential method for setting up an optimizedsquare beam. The axis 1740 shown corresponds to position along any ofthe scan directions 1702, 1704 or 1706. The intensity axis 1741 isrelative, from 0.0, corresponding to no imaging signal detected, up to1.0, corresponding to the maximum imaging signal detected. Curve 1742corresponds to either scan direction 1702 or 1706. The rise in intensityfrom 0.0 to 1.0 for curve 1742 is from −27.5 nm to +27.5 nm. The 45°curve 1743 corresponds to scan direction 1704. The rise from 0.0 to 1.0for curve 1743 is from −42.5 nm to +42.5 nm, a much slower rise than forcurve 1742. This difference in width of the intensity rise in the twocurves 1742 and 1743 can be used to tune the optical column to generatethe squarest beam profile possible. Center point 1745 corresponds tobeams at locations 1703, 1705 or 1707.

For comparison, an intensity curve 1744 has been plotted for a singleGaussian beam with a 40 nm FWHM. Far from the beam center at 0 nm, thiscurve overlaps curve 1743. Near the beam center at 0 nm, this curve hasan even slower rise than either of curves 1742 or 1743. The keydifference is that the Gaussian curve will have the same shape for anyscan direction 1702, 1704 or 1706, distinguishing a Gaussian beam from asquare beam when the detector surface 1713 is used for imaging.

FIG. 18 shows a calculated exposure dose at position A of FIG. 9 due toa single flash of a 30 nm square electron beam, using the patternedbeam-defining aperture 212 of FIG. 8A. Coordinate axes on the substratesurface 221 are X 1801 and Y 1802. When lithographically patterning avariety of shapes on a substrate, it is useful to be able to generate arange of shaped beam sizes without the need for mechanical exchange ofthe patterned beam-defining aperture 212. By adjustment of the electronoptics in the upper part of the column (typically by changing the commonvoltage on the first source lens electrode 203 and the beam-limitingaperture 204), the diameter of the circular beam 222 illuminating thebeam-trimming aperture (BTA) 276 can be adjusted to vary the shaped beamsize at the wafer surface 221 (see FIG. 3D). In the example shown inFIG. 18, the upper column optics has been adjusted to generate a 30 nmsquare beam 1804 (instead of the 40 nm square beam shown in FIG. 10A).Because in this configuration the overall optics cannot be fullyoptimized to give the highest current density beam (which would requirea different BTA 276 and PBDA 212), the exposure beam current density hasbeen reduced to 2000 A/cm², requiring a 2.50 ns dwell time for a 5μC/cm² resist sensitivity. Area 1804, corresponding to current densities≧2000 A/cm², is approximately a 30 nm square. In region 1803 theexposure dose is <5 μC/cm² thus the resist will not be fully exposed.The combined effects of the virtual source size, chromatic aberration(to all orders), and spherical aberration (to all orders) are fullytaken into account in this calculation. FIG. 18 demonstrates that theoptical system of FIG. 2A, which was optimized for generation of a 40 nmsquare beam, can also be used to generate a 30 nm square beam. Theperformance shown in FIG. 18 is adequate to enable the patterning offeatures down to 30 nm resolution with dwell times only slightly longerthan for the optimized 40 nm case illustrated in FIGS. 10A-15.

FIG. 19 shows a calculated exposure dose at position A of FIG. 9 due toa single flash of an ˜80 nm square electron beam, using the patternedbeam-defining aperture 212 of FIG. 8A. Coordinate axes on the substratesurface 221 are X 1901 and Y 1902. In this example, the electron opticsin the upper part of the column have been adjusted in the oppositedirection from that shown in FIG. 18 to give a square beam 1904approximately twice as large (˜80 nm) as in FIG. 10A. Because in thisconfiguration the overall optics cannot be fully optimized to give thehighest current density beam (which would require a different BTA 276and PBDA 212), the exposure beam current density has been reduced to2500 A/cm², requiring a 2.00 ns dwell time for a 5 μC/cm² resistsensitivity. Area 1904, corresponding to current densities ≧2500 A/cm²,is ˜80 nm square. In region 1903 the exposure dose is <5 μC/cm² thus theresist will not be fully exposed. The combined effects of the virtualsource size, chromatic aberration (to all orders), and sphericalaberration (to all orders) are fully taken into account in thiscalculation. FIG. 19 demonstrates that the optical system of FIG. 2A,which was optimized for generation of a 40 nm square beam, can also beused to generate an ˜80 nm square beam. The performance shown in FIG. 19is adequate to enable the patterning of features at 80 nm resolutionwith dwell times only slightly longer than for the optimized 40 nm caseshown in FIGS. 10A-15.

FIG. 20 shows a calculated exposure dose at position A of FIG. 9 due toa single flash of a 120 nm square electron beam, using the patternedbeam-defining aperture 212 of FIG. 8A. Coordinate axes on the substratesurface 221 are X 2001 and Y 2002. In this example, the electron opticsin the upper part of the column have been adjusted farther in the samedirection as that shown in FIG. 19 to give a beam 2004 three times aslarge (120 nm) as in FIG. 10A. Because in this configuration the overalloptics cannot be fully optimized to give the highest current densitybeam (which would require a different BTA 276 and PBDA 212), theexposure beam current density has been reduced to 2000 A/cm², requiringa 2.50 ns dwell time for a 5 μC/cm² resist sensitivity. Area 2004,corresponding to current densities ≧2000 A/cm², is a 120 nm square. Inregion 2003 the exposure dose is <5 μC/cm² thus the resist will not befully exposed. The combined effects of the virtual source size,chromatic aberration (to all orders), and spherical aberration (to allorders) are fully taken into account in this calculation. FIG. 20demonstrates that the optical system of FIG. 2A, which was optimized forgeneration of a 40 nm square beam, can also be used to generate a 120 nmsquare beam. The performance shown in FIG. 20 is adequate to enable thepatterning of features at 120 nm resolution with dwell times onlyslightly longer than for the optimized 40 nm case shown in FIGS. 10A-15.With a 120 nm square beam, it is possible to completely write a 2 μmsquare subfield with 256 flashes (on 125 nm center-to-centerspacings)—this is necessary to fill in large areas to be written such asbonding pads.

FIG. 21A is a graph of the source lens focusing voltage 2105 (left axis2101) and main lens focusing voltage 2104 (right axis 2102) in thecolumn of FIG. 2A against the square beam size 2103. The source lensvoltage 2105 is applied to both the first lens electrode 203 andbeam-limiting aperture 204. The main lens voltage 2104 is applied tofocus-2 support electrode 240 and is also the common mode voltage forthe octupole electrodes 241-248. FIG. 21A shows a number of values forthe source lens voltage 2105 and the main lens voltage 2104 for variousdesired square beam sizes 2103, ranging from 30 nm to 120 nm. Curve 2105is much lower than the energy of the incoming electrons from the sourcetip 201, which are typically at energies >2800 eV—this shows that thesource lens is a decelerating electrostatic lens. Curve 2104 ranges frombelow to above the energy of the electrons entering the main lens whichare at 5000 eV. The main focusing effect occurs between the focus-2assembly 217, ranging from 4906.5 V to 5217.2 V and the field-free tube218 which is at 49986 V for writing on the wafer 221 at 50000 eV.

FIG. 21B is a graph of the half-angle 2114 (left axis 2111) at thesource tip 201 and the beam current 2115 (right axis 2112) at the wafersurface 221 against the square beam size 2113. The half-angle 2114 atthe source tip 201 has the following relationship to the beam current2115 at the wafer surface 221:

I_(s) = source angular intensity over the emission solid angle used toilluminate the patterned beam-defining aperture 212 (typically thisangular intensity ranges from 100 μA/sr to >500 μA/sr). We assume I_(s)= 500 μA/sr in the table below. The angular intensity is generallyfairly constant within a few degrees half-angle of the optical axis. α =the half-angle of the beam 222 at the source tip 201 (in degrees)I_(beam) = the beam current at the wafer surface 221 = I_(s) [π (απ/180°)²]

Nominal Square Tip Beam Current Beam Size Half-Angle at Wafer CurrentDensity 30 nm 0.4°  49.2 nA 2000 A/cm² 40 nm 0.8° 196.9 nA 3000 A/cm² 80nm 1.2° 443.1 nA 2500 A/cm² 120 nm  1.5° 758.1 nA 2000 A/cm²

The optics design in block 106 of FIG. 1 was optimized to generate a 40nm square beam with the highest current density possible. This meansthat the optics are not optimized for the other beam sizes (30 nm, 80nm, and 120 nm) in the table and shown in FIGS. 21A-21D. This is thereason for the drop-off in current density seen in the table for beamsboth smaller and larger than 40 nm (see curve 2125 in FIG. 21C). It ispossible to optimize the optics design in block 106 of FIG. 1 for beamseither larger or smaller than 40 nm—in particular, for toolextendibility to future device generations, the optimization could bedone for 30 nm or even smaller. In this case, the performance for largerbeams would likely be reduced, but probably not by a large amount.

FIG. 21C is a graph of the flash time 2124 (left axis 2121) and thecurrent density 2125 (right axis 2122) at the wafer surface 221(assuming a 5 μC/cm² resist sensitivity) against the square beam size2123. The flash time and the current density have an inverserelationship:(current density)=(5 μC/cm²)/(flash time)Thus as the current density 2125 increases, the flash time 2124decreases inversely. Again, since the optics design was optimized for a40 nm beam, the performance at all other beam sizes, both smaller andlarger than 40 nm, is not as good in terms of flash time 2124 (shortestflash times are best). The deterioration from 40 nm down to 30 nm ismost striking, indicating that an optics design optimized for 30 nmmight perform fairly well at 40 nm and above (although not as well asshown in FIG. 21C). As would be expected, the closer the beam size is tothe optimal size, the better the performance in terms of flash time.

FIG. 21D is a graph of the magnification 2134 (left axis 2131) of thevirtual source at the wafer surface 221 against the square beam size2133. The magnification 2134 determines how much rounding of the cornersof the square beam occurs due to the image of the virtual source—thelower the magnification 2134, the sharper the corners. For a Schottkyelectron source, the virtual source radius is 10 nm, so a magnificationof 0.17× corresponds to (0.17)(10 nm)=1.7 nm radius of the square beamcorners at the wafer surface 221 due to the virtual source. Chromaticand geometric aberrations add additional rounding.

FIG. 22 is a diagram of a beam-blanking strategy which can be used tovary the exposure dose on a subfield-by-subfield basis in order toimplement proximity effect correction. For simplicity, in FIG. 22 theupper blanker is shown as two planar electrodes 2202 and 2203, one oneach side of the beam 222. Similarly, the lower blanker is shown as twoplanar electrodes 2204 and 2205, one on each side of the beam 222.Electrons emitted from the source tip 201 are focused by the source lens2201 to an approximately parallel beam 222 which illuminates thebeam-defining aperture (BDA) 212, supported by BDA mount 211.

View (a) shows an unblanked beam 222 passing through the beam-definingaperture 212 and into the lower part of the optical column, where it isfocused onto the wafer surface 221 by the main lens assembly. In thiscase, the blanker plates 2202, 2203, 2204 and 2205 are at the samevoltage (typically 5000 V) and thus do not induce transverse electricfields. With no transverse electric fields, no deflection of the beam222 occurs at the blanker.

View (b) shows the beam being blanked. The voltage on electrode 2202 hasbeen changed by +1.7 V and the voltage on electrode 2203 has beenchanged by −1.7 V—this creates a transverse electric field 2240 whichdeflects beam 222 upward as it passes through the upper blanker.Similarly, the voltage on electrode 2204 is changed by −1.54 V and thevoltage on electrode 2205 has been changed by +1.54 V, creating atransverse electric field 2241 in the opposite direction from that inthe upper blanker, which deflects the beam downwards as it passesthrough the lower blanker. The net result of the two deflections is thatthe beam 222 reaches the plane of the patterned beam-defining aperture(PBDA) 212 off-axis and does not pass through the opening. With properadjustment of the voltages on the upper and lower blankers, the virtualsource position remains on-axis, giving conjugate blanking.

View (c) is a timing diagram showing a possible method for controllingthe exposure dose at the wafer surface 221 as part of a method forproximity effect correction. The center of beam 222 has three possiblepositions at the PBDA 212: +d, 0 (unblanked), and −d. The beam maydynamically have intermediate positions between −d and +d as it sweepsacross the PBDA 212. Five intervals 2221-2225 are shown, each a period Tlong, for a total of 5 T as shown along the time axis 2245. Displacementat the PBDA 212 is plotted on the axis 2210. According to therequirements of proximity effect correction (PEC), it may be necessaryto vary the dose for different subfields, as illustrated in intervals2222, 2224 and 2225.

-   -   (1) In the first interval 2221, the beam is blanked by being        held at a distance +d 2231 off-axis as shown in view (b).    -   (2) The second interval 2222 illustrates a high dose blanking        signal for which the beam 222 is linearly ramped 2232 across the        PBDA 212. Because ramp 2232 takes the full interval period T, it        represents the maximum exposure dose possible, corresponding to        writing in sparsely-patterned areas with essentially no        proximity effect correction needed.    -   (3) The third interval 2223, shows the alternative blanking        position to interval 2221. In interval 2223, the beam is held at        a distance −d 2233, corresponding to the mirror-image (around        the optical axis) of view (b).    -   (4) The fourth interval 2224 shows a very low dose blanking        signal, where the beam 222 is quickly ramped 2234 across the        beam-defining aperture 212 from −d to +d then kept at the +d        2235 position (blanked) during the remainder of the interval        period T. This corresponds to writing in densely-patterned areas        with a large proximity effect correction.    -   (5) The last interval 2225 shows an intermediate situation        between intervals 2222 and 2224, where the beam is ramped 2236        for most of the interval 2225 from +d to −d, and then held at −d        2237 for the remainder of the interval period T. This        corresponds to writing in an area with a lower pattern density        than in interval 2224, but higher than in interval 2222.        A possible advantage of this blanking approach may be ease of        implementation electronically, since it can be very difficult to        generate ns blanking pulses with sub-ns precision in the pulse        length. In this proposed approach, only the ramp rate need be        controlled, with lower blanking bandwidth required since there        are no short rise and fall requirements on the voltages applied        to the blanker plates 2202, 2203, 2204 and 2205.

An alternative blanking scheme would be to employ the more conventionalapproach in which the beam is rapidly deflected from a first blankedposition (for example, +d) onto the optical axis (thereby unblanking thebeam 222). After the beam has remained centered on the PBDA 212 for therequired exposure time, the beam would then be rapidly deflected to itssecond blanked position (for example, −d). The disadvantage of thisapproach is the need for higher-bandwidth blankers, since now the slewrate represents a possible error in the pixel exposure time. Theadvantage of going from the first blanked position and ending at thesecond blanked position is that every point of the PBDA 212 has the sametotal beam dwell time, thereby equalizing the dose across the shapedbeam. For the next pixel to be exposed, the first blanked position wouldbe −d and the second blanked position would be +d. Successive pixelswould be exposed using alternating blanking positions, with the beamtoggling back-and-forth across the PBDA 212 as shown in FIG. 22.

FIG. 23 is a cross-sectional close-up side view of the main lensillustrating the calculated set-up for the focus-1 and focus-2 octupolevoltages. The beam 222 enters the main lens after exiting the subfielddeflector/stigmator 215. The beam 222 at this point may have beenalready deflected off-axis by up to ±20 μm—to avoid off-axis geometricalaberrations (coma, astigmatism, curvature of field, distortion) andoff-axis chromatic aberration (variation in magnification), it isnecessary to move the electrostatic fields generated by the focus-1assembly 216 and the focus-2 assembly 217 off-axis also by ±20 μm. Inthe prior art, various complex schemes are utilized to achieve a “movingobjective lens” or a “variable axis lens”, employing the higher-orderderivatives of the on-axis electrostatic and/or magnetic lens fields tocontrol the application of dipole, quadrupole, hexapole, octupole andhigher-order fields to the on-axis lens fields to offset the effectivelens axis to match the beam deflection. If larger off-axis deflectionsof the shaped beam are required, it might be necessary to incorporate amore complex moving lens scheme utilizing some or all of theseadditional optical elements. In the present invention, a much simplerapproach is proposed, wherein pure dipole fields are added to thefocus-1 216 and focus-2 217 fields.

The focus-1 assembly 216 comprises the support electrode 230 and theoctupole electrodes 231-238 (in the cross-sectional view in FIG. 23,only electrodes 232 and 237 are visible). In the discussion of FIGS.3K-3L, the various voltages employed to offset the electrostatic fieldto match the beam deflection are discussed. FIG. 23 shows the resultingelectrostatic equipotential lines. Lines 2301 bulge into the areabetween the subfield deflector/stigmator 215 and focus-1 assembly 216,while lines 2310 bulge out into the area between the focus-1 assembly216 and focus-2 assembly 217. The shape of lines 2301 and 2310 isdetermined by the voltages on the subfield deflector/stigmator 215,support electrode 230, and the eight focus-1 octupole electrodes231-238. The voltages on the focus-2 assembly 217 have a minor effect onlines 2301 but an important effect on lines 2310. The inner diameter(ID) of the eight octupole electrodes 231-238 is smaller than the ID ofthe support electrode 230 so that electrodes 231-238 will have thedominant effect on the position and shape of equipotential lines 2301and 2310. By adding a small (<3 V) electrostatic dipole component to theoctupole electrodes 231-238, on top of their 5000 V common-mode voltage(see table in FIG. 3K description), it is possible to move the lines2301 and 2310 off-axis by ±20 μm to match the beam deflection arisingfrom the mainfield deflectors 213 and 214. The beam position radiallyoff-axis is determined theoretically at location 2305 and the voltageson electrodes 231-238 are then adjusted to eliminate any deflection ofthe beam 222 when passing through the focus-1 assembly 216. Lack of beamdeflection is taken as an indication that the lines 2301 have beenproperly offset, matching the beam 222 offset.

The beam 222 enters the focus-2 assembly 217 after exiting the focus-1assembly 216. The beam 222 at this point should be undeflected by thefocus-1 assembly 216 (if the setup procedure above has been doneproperly), so beam 222 may be deflected off-axis by up to ±20 μm. Thefocus-2 assembly 217 comprises the support electrode 240 and eightfocus-2 octupole electrodes 241-248 (in the cross-sectional view in FIG.23, only electrodes 242 and 247 are visible). In FIG. 3L, the variousvoltages employed to offset the electrostatic field to match the beamdeflection are discussed. FIG. 23 shows the resulting electrostaticequipotential lines. Lines 2303 and 2310 bulge into the area between thefocus-1 assembly 216 and focus-2 assembly 217. The shape of lines 2303and 2310 is determined by the voltages on the eight focus-1 octupoleelectrodes 231-238, support electrode 240, and the eight focus-2octupole electrodes 241-248. The voltage on the field-free tube 218 hasa minor effect on the spacing of lines 2303 and line 2302. The ID of theeight focus-2 octupole electrodes 241-248 is much smaller than the ID ofsupport electrode 240 so that electrodes 241-248 will have the dominanteffect on the position and shape of lines 2303 and 2310. By adding anelectrostatic dipole component (˜100 V) to electrodes 241-238, on top oftheir ˜4900-5200 V common-mode voltage (see table in FIG. 3Ldescription), it is possible to move the lines 2303 and 2310 off-axis tomatch the beam deflection arising from the mainfield deflectors 213 and214. The beam position radially off-axis is determined theoretically atlocation 2306 and the voltages on electrodes 241-248 are then adjustedto eliminate almost all deflection of the beam 222 when passing throughthe focus-2 assembly 217. Lack of beam deflection is taken as anindication that the lines 2303 and 2310 have been properly offset,matching the beam 222 offset.

The above procedure for setting the voltages on the focus-1 octupole231-238 and the focus-2 octupole 241-248 have been theoreticallydetermined. In practice, at least two iterations between the focus-1 216setup and the focus-2 217 setup are usually required before thedeflections at locations 2305 and 2306 are both eliminated. In theelectron optical modeling, the dipole voltages on octupoles 231-238 and241-248 vary linearly with the beam offset, and the sensitivity of thefinal result on the beam shape at the wafer 221 is not excessive.Because of this, the voltages obtained through the theoretical modeling(tables in FIGS. 3K and 3L descriptions), combined with the line-scanprocedures described in FIGS. 17A-17B should be adequate to implementthis proposed lens offsetting scheme.

FIG. 24 is a diagrammatic illustration of one embodiment of the waferstage and position sensors. In a lithography system, the substrate,shown as a 300 mm wafer 2401 here, is typically mounted on a precisionstage 2402, capable of X-Y motion, and sometimes additional axes ofmotion such as yaw (rotation around the Z-axis, which is perpendicularto the wafer), Z-motion, and roll and pitch (rotation around twoperpendicular axes X and Y in the plane of the wafer). Here we areconcerned with just motion in the first three axes: X, Y and Yaw.Y-interferometer #1 2406 and Y-interferometer #2 2407 direct theirrespective laser beams 2416 and 2417 at stage mirror 2404. It isimportant that the wafer 2401 be tightly clamped to the stage 2402 andalso that the mirror 2404 be extremely flat and rigidly mounted to thestage 2402, because any relative motion between the wafer 2401 and themirror 2404 will adversely impact the positioning accuracy of the beam222 in the Y-direction and around the Yaw axis at the wafer surface 221.The X-interferometer 2405 directs its laser beam 2415 at stage mirror2403, which must be extremely flat and rigidly mounted to the stage 2402to avoid beam positioning errors in the X-direction. The X- and Y-axesof stage 2402 travel are defined by the relative positioning of mirrors2403 and 2404—if these mirrors are not perpendicular to each other, thenthe X and Y axes will not be, either. The following formulas are used tocalculate the X, Y and Yaw positions of the wafer 2401 relative to thecenter 2422 of the stage 2402:Y=[(Y-interferometer #1 2406 data)+(Y-interferometer #2 2407 data)]/2*K₁X=(X-interferometer 2405 data)*K ₂Yaw=[(Y-interferometer #1 2406 data)−(Y-interferometer #2 2407 data)]2*K₃Where K₁, K₂, and K₃ are scale factors.

Each column in the column array has a unique X-Y displacement vector,such as 2420 and 2421, from the stage center 2422. The position of eachdie on the wafer relative to a particular column is then calculated bycombining the following data:

-   -   1) the (X, Y, Yaw) position of the stage from its (0, 0, 0)        position    -   2) the (X, Y) displacement vector of the particular column from        the stage (0, 0, 0) position    -   3) the (X, Y, Yaw) location of the wafer on the stage (measured        by imaging several alignment marks on the wafer)        This scheme for wafer position measurement is familiar to those        skilled in the art, with the only additional considerations        stemming from the use of multiple columns. An example of one        wafer stage which is appropriate for use with the multiple beam        column assembly is described in U.S. Pat. No. 6,355,994,        incorporated herein by reference. An example of a control system        incorporating a scheme for wafer position measurement is        described in U.S. patent application Ser. No. 10/059,048,        incorporated herein by reference.

FIG. 25 is a schematic diagram of an embodiment of the optical columnand its control electronics (compare with FIG. 2A). The source and lenscontrol 2510 applies voltages to the electron source tip 201, sourceheater filament (not shown), suppressor electrode 2501, extractionelectrode 202, first source lens electrode 203, beam-limiting aperture204, and second source lens electrode 205. The alignment deflectorscontrol 2512 applies voltages to the eight electrodes 260-267 in theupper alignment deflector/stigmator 207 and to the eight electrodes268-275 in the lower alignment deflector 208. The accel column control2513 supplies voltages to all of the electrodes in the acceleratingassembly 209 and to the optics mounting plate 210. The beam blankerdriver 2511 applies voltages to the electrodes 280-282 in the upperblanker 277 and to the electrodes 283-285 in the lower blanker 278. Themainfield deflectors control 2514 applies four voltages to theelectrodes 4001, 4009, 4012, and 4020 in the upper mainfield deflector213 and the same four voltages (connected with the opposite polarity—seeFIGS. 3H and 3I) to the electrodes 4101, 4109, 4112, and 4120 in thelower mainfield deflector 214. The subfield deflector and stigmatorcontrol 2515 supplies voltages to the eight electrodes 223-230 of thesubfield deflector/stigmator 215. The main lens and wafer bias control2516 supplies voltages to the nine electrodes 230-238 of the focus-1electrode assembly 216, to the nine electrodes 240-248 of the focus-2electrode assembly 217, to the field-free tube 218, to the voltagecontrast plate 220, and to the wafer 221. The main lens and wafer biascontrol 2516 also supplies the common-mode voltage to the detectorcontrol 2517. The detector control 2517 supplies bias voltages to thedetector assembly 219.

For a multi-column assembly, only one Accel Column Control 2513 may berequired, if all of the multiple beams pass through the sameaccelerating column. In some embodiments, it might be possible toutilize a single Mainfield Deflectors Control 2514. The other columncontrols 2510-2512 and 2515-2517 would generally apply to one columnonly.

FIG. 26 is a schematic diagram of one embodiment of the data path andsystem control electronics. Datablock 2601 supplies X, Y1 and Y2 datafrom the three interferometers 2405, 2406, and 2407, respectively (seeFIG. 24), to the data path and system control electronics along threehigh-speed data links, X 2602, (Y1+Y2)/2 2603, and (Y1−Y2)/2 2604.Datalinks X 2602 and (Y1+Y2)/2 2603 connect to block 2605, whichdetermines the (X, Y) position of the center 2422 of the wafer stage2402 relative to the (X, Y) position of the column array center.Datalink (Y1−Y2)/2 2604 connects to block 2606 which determines the yawangle of the wafer stage 2402 relative to the column array 2640. Block2607 contains the (X, Y) coordinates of each of the columns (i, j) inthe column array 2640, which have been previously determinedempirically—this (X, Y) coordinate data is supplied by datalink 2609 toblock 2608, which combines data supplied by datalinks 2609, 2610, and2641 to determine the (X, Y) position of each column (i, j) relative tothe wafer 2401. Block 2614 uses the data from block 2608 to determinethe (X, Y) coordinates of the subfields to be written by each column (i,j). Block 2618 receives the (X, Y) subfield coordinates generated byblock 2614 through datalink 2619. Given the (X, Y) subfield coordinates,then block 2618 receives the subfield pattern data through datalink 2616from the pattern library storage 2615 where (50 μm stripe width)/(2 μmsubfield width)=25 subfield pattern datasets are required for eachcolumn. In the embodiment shown, there are 6×6=36 columns, so the totalnumber of datasets downloaded through datalink 2616 to block 2618 is25×36=900 subfield datasets. Block 2618 is connected to the systemcontrol computer 2650 through datalink 2617. Subfield pattern data fromblock 2618 is sent to the Data Processor 2621 through datalink 2620.From the Data Processor 2621, subfield pattern data is fed in 36parallel datalinks 2622 to the Stripe Data Buffers 2623 (one percolumn), which buffer this data in preparation for writing. Columncontrollers 2625 (one per column) receive this data through 36 datalinks2624. The 36 column controllers 2625 supply the subfield data throughdatalinks 2626 to the various column power supplies as shown in FIG. 26:the Source Lens Control 2510, the Alignment Deflectors Control 2512, theBeam Blanker Driver 2511, the Mainfield Deflectors Control 2514, theSubfield Deflector and Stigmator Control 2515, the Main Lens and WaferBias Control 2516, and the Detector Control 2517.

FIG. 27A (a) shows how (for the example of a 300 mm wafer and a 6×6column array) the 50 mm×50 mm column writing area 2701 can be brokendown into 50 μm-wide stripes 2702. The number of writing stripes 2702 inarea 2701 is:

$\begin{matrix}{{{Number}\mspace{14mu}{of}\mspace{14mu}{stripes}} = {\left( {{column}\mspace{14mu}{spacing}} \right)/\left( {{stripe}\mspace{14mu}{width}} \right)}} \\{= {\left( {50\mspace{14mu}{mm}} \right)\text{/}\left( {50\mspace{14mu}\mu\; m} \right)}} \\{= {1000\mspace{14mu}{writing}\mspace{14mu}{stripes}}}\end{matrix}$View (b) shows the end of a typical writing stripe 2702, where theindividual 2 μm square subfields 2703 are shown. The total number ofsubfields 2703 per scan is then:

$\begin{matrix}{{\#\mspace{14mu}{Subfields}\text{/}{scan}} = {\left( {{stripe}\mspace{14mu}{width}} \right)/\left( {{subfield}\mspace{14mu}{dimension}} \right)}} \\{= {\left( {50\mspace{14mu}\mu\; m} \right)/\left( {2\mspace{14mu}\mu\; m} \right)}} \\{= {25\mspace{14mu}{subfields}}}\end{matrix}$A close-up of one subfield 2703 is shown in view (c), where the 1 nm X-Yaddress grid is expanded at the lower right corner. View (d) shows the 1nm address grid 2704 and 2705. The number of steps in the address gridper subfield is then:# Address Steps=(subfield dimension)/(address grid)=(2 μm)/(1nm)=2000≅2¹¹To address ˜2¹¹ address grid steps in one axis requires the followingnumber of address bits:# Address Bits=log₂(# address steps)≅11 bitsSince addressing is two-dimensional, a total of 22 address bits issufficient to define the beam position anywhere within a given 2 μmsquare subfield 2703.

FIG. 27B is an illustration of an embodiment of the method for writing50 μm-wide stripes simultaneously with a large number of columnspositioned in an X-Y array. View (a) is a perspective view of an arrayof beams 2706 (each equivalent to beam 222 in FIG. 2A), writing on a 300mm wafer 2401 in parallel. Each beam 2706 writes an area 2701.

View (b) is a close-up of one area 2701, showing a beam 2706 writing thearea 2710. Note that scan deflection 2740 maintains beam 2706 alwaysperpendicular to the wafer surface 221, thereby giving telecentricscanning. In FIG. 27A, each scan writes a total of 25 subfields 2703,each 2 μm square. The wafer stage 2402 travels in a serpentine pattern2711, alternately in the +Y, −Y, +Y, . . . directions, while beamscanning is in the X-direction 2740. Between scans 2707, the wafer steps2708 along the X-direction over to the beginning of the next stripe 2702to be written. View (c) is a detail view of the scan 2712, showing the25 subfields 2703 and the 50 μm scan width 2715. During the writing of ascan 2715, the stage moves a distance 2714, in a “write-on-the-fly”process familiar to those skilled in the art.

FIG. 27C is a diagram showing an example of the correspondence betweenthe die arrangement on a typical 300 mm wafer 2401 and the column X-Yarray with X-axis 2730 and Y-axis 2731. Column writing areas 2701 haveX-Y dimensions determined by the calculations for FIG. 27A, in thisexample (a 6×6 column array), 50 mm×50 mm. As shown, the corner columns[such as (0, 0), (0, 5), (5, 0) and (5, 5)] write very little area onthe wafer. For larger column arrays (such as 7×7, 8×8, . . . ) it ispossible to delete one or more columns at each of the four corners ofthe column array. The columns have X-labels 2721 and Y-labels 2720,where for a 6×6 column array, the labels range from 0 to 5. The columnarray center will be between columns for even-numbered arrays (such as6×6, 8×8, . . . ) and will be at the center of a column for odd-numberedarrays (such as 7×7, 9×9, . . . ).

In this example, die dimensions have been assumed to be: X-dimension=22mm, Y-dimension=19.5 mm. With no edge exclusion at the edge of wafer2401, this gives 143 dies total. There is no requirement for the X-Yspacings of the column array to match the X-Y spacings of the die arrayon the wafer 2401.

FIG. 28A is a diagram of integrated circuit (IC) pattern data 2801broken down into subfields 2804, each with a 2 μm X-dimension 2805 andwith a 2 μm Y-dimension 2806. Subfields 2804 each have a 1 nm X-Yaddress grid 2807 and 2808. The exact same subfield and address-gridvalues are used for both the column beam addressing and for the ICpattern data—the requirement on the data path electronics is then toadjust the position of the writing beams (a maximum offset of ±1 μm inX-Y) to overlay the pattern data on the writing grid. The IC patterndata is aligned with the X-axis 2809 and Y-axis 2810, corresponding tothe X-axis 2730 and Y-axis 2731 for the column array in FIG. 27C.

FIG. 28B shows an example of a subfield header data format. The subfieldaddressing requirements for the IC pattern data are as follows:

64 mm×64 mm maximum IC size (4096 mm²)

2 μm×2 μm subfield address grid within the IC

16-bit X-address of the subfield within the IC

16-bit Y-address of the subfield within the IC

Within each 2 μm square subfield, the pattern addressing requirementsare:

1 nm×1 nm pattern address grid within the subfield

16-bit X-coordinate of the pattern within the subfield

16-bit Y-coordinate of the pattern within the subfield

For each subfield 2804 in the IC pattern data 2801, a subfield header2811 is defined, consisting of 9 bytes 2817, and containing thefollowing data fields:

Bytes #0-1 2812 = total number of patterns to be exposed within the 2 μmsquare subfield - the maximum number is 2¹⁶ − 1 = 65535. Bytes #2-3 2813= X-address of the subfield (−32768 μm to +32767 μm in 2 μm units).Bytes #4-5 2814 = Y-address of the subfield (−32768 μm to +32767 μm in 2μm units). Byte #6 2815 = PEC dose level (from no correction = 255 tomaximum correction = 0 - see FIG. 29C). Byte #7 2816 = fraction ofsubfield area written (no writing = 0 to completely written = 255 - seeFIG. 29A). Byte #8 2818 = square beam size for writing this subfield(beam size = byte #8 value in nm: from 0 nm to 255 nm).If it were more efficient to write a subfield with more than one beamsize, then multiple subfield data definitions (each with its ownsubfield header) would be required.

FIG. 28C is a diagrammatic representation of examples of pattern dataformats for writing a single flash and multiple flashes. The data format2820 for a single flash requires five bytes 2817:

-   -   TL4 per NB

Byte #0 2821=pattern type (=1).

Bytes #1-2 2822=X-address of flash (−1000 nm to 1000 nm)

Bytes #3-4 2823=Y-address of flash (−1000 nm to 1000 nm)

The data format 2838 for multiple (number=N) flashes requires 4N+2 bytes2817:

Byte #0 2821=pattern type (=2).

Byte #1 2825=number of flashes (2 to 255)

Bytes #2-3 2826=X-address of flash #1 (−1000 nm to 1000 nm)

Bytes #4-5 2827=Y-address of flash #1 (−1000 nm to 1000 nm)

Bytes #2-3 2829=X-address of flash #2 (−1000 nm to 1000 nm)

Bytes #4-5 2830=Y-address of flash #2 (−1000 nm to 1000 nm)

Bytes #2-3 2832=X-address of flash #3 (−1000 nm to 1000 nm)

Bytes #4-5 2833=Y-address of flash #3 (−1000 nm to 1000 nm)

. . .

Bytes #2-3 2835=X-address of flash #N (−1000 nm to 1000 nm)

Bytes #4-5 2836=Y-address of flash #N (−1000 nm to 1000 nm)

FIG. 28D is a diagrammatic representation of examples of pattern dataformats for writing a single line and a polyline. The data format 2840for a single line requires nine bytes 2817:

Byte #0 2821=pattern type (=3).

Bytes #1-2 2841=X-address of line start (−1000 nm to 1000 nm)

Bytes #3-4 2842=Y-address of line start (−1000 nm to 1000 nm)

Bytes #5-6 2844=X-address of line end (−1000 nm to 1000 nm)

Bytes #7-8 2845=Y-address of line end (−1000 nm to 1000 nm)

The data format 2847 for a polyline (number=N) requires 4N+6 bytes 2817:

Byte #0 2821=pattern type (=4).

Byte #1 2848=number of lines in the polyline (2 to 255)

Bytes #2-3 2849=X-address of line #1 start (−1000 nm to 1000 nm)

Bytes #4-5 2850=Y-address of line #1 start (−1000 nm to 1000 nm)

Bytes #6-7 2852=X-address of line #1 end (−1000 nm to 1000 nm)

-   -   =X-address of line #2 start (−1000 nm to 1000 nm)

Bytes #8-9 2853=Y-address of line #1 end (−1000 nm to 1000 nm)

-   -   =Y-address of line #2 start (−1000 nm to 1000 nm)

Bytes #10-11 2855=X-address of line #2 end (−1000 nm to 1000 nm)

-   -   =X-address of line #3 start (−1000 nm to 1000 nm)

Bytes #12-13 2856=Y-address of line #2 end (−1000 nm to 1000 nm)

-   -   =Y-address of line #3 start (−1000 nm to 1000 nm)

. . .

Bytes #4N+2−4N+3 2858

-   -   =X-address of line #N end (−1000 nm to 1000 nm)

Bytes #4N+4−4N+5 2859

-   -   =Y-address of line #N end (−1000 nm to 1000 nm)

FIG. 28E is a diagrammatic representation of examples of pattern dataformats for writing an entire subfield, for writing a rectangle, or forwriting a triangle in the upper right quadrant. The data format 2861 tofill an entire subfield requires only one byte 2817:

Byte #0 2821=pattern type (=5).

The data format 2862 for a rectangle requires nine bytes 2817:

Byte #0 2821=pattern type (=6).

Bytes #1-2 2863

-   -   =X-address of upper left corner (−1000 nm to 1000 nm)

Bytes #3-4 2864

-   -   =Y-address of upper left corner (−1000 nm to 1000 nm)

Bytes #5-6 2866

-   -   =X-address of lower right corner (−1000 nm to 1000 nm)

Bytes #7-8 2867

-   -   =Y-address of lower right corner (−1000 nm to 1000 nm)        The data format 2869 for a triangle in the upper right quadrant        requires nine bytes 2817:

Byte #0 2821=pattern type (=7).

Bytes #1-2 2870

-   -   =X-address of upper left corner (−1000 nm to 1000 nm)

Bytes #3-4 2871

-   -   =Y-address of upper left corner (−1000 nm to 1000 nm)

Bytes #5-6 2873

-   -   =X-address of lower right corner (−1000 nm to 1000 nm)

Bytes #7-8 2874

-   -   =Y-address of lower right corner (−1000 nm to 1000 nm)        For writing triangles in the upper left, lower left and lower        right quadrants, the pattern types are 8, 9 and 10,        respectively. The data formats for pattern types 8-10 are        identical to that for pattern type 7, above.

FIG. 28F shows an illustrative example of a typical subfield 2804containing multiple written pattern types:

Type #1—single flash at location (X_(sf), Y_(sf)) 2901, where thesubscript “sf” denotes a single flash.

Type #2—multiple flashes 2902 at locations (X_(mf1), Y_(mf1)) 2903,(X_(mf2), Y_(mf2)) 2904, (X_(mf3), Y_(mf3)) 2905, and (X_(mf4), Y_(mf4))2906. The subscripts “mfX” denote multiple flashes, and X is the flashnumber (1-4 in this example).

Type #3—a single line 2907 starting at location (X_(sl0), Y_(sl0)) 2908and ending at location (X_(sl1), Y_(sl1)) 2909. The “sl” subscriptsdenote a single line.

Type #4—a polyline 2910 starting at location (X_(pl0), Y_(pl0)) 2911,going to point (X_(pl1), Y_(pl1)) 2912, then point (X_(pl2), Y_(pl2))2913 and ending at point (X_(pl3), Y_(pl3)) 2914. The “pl” subscriptsdenote a polyline.

Type #6—a rectangle 2918 with upper left corner at (X_(r0), Y_(r0)) 2919and lower right corner at (X_(r1), Y_(r1)) 2920. The “r” subscriptsdenote rectangle.

Type #9—a triangle 2915 in the lower left quadrant with upper leftcorner at (X_(tc0), Y_(tc0)) 2916 and lower right corner at (X_(tc1),Y_(tc1)) 2917. The “tc” subscripts denote triangle type c (lower leftquadrant). Other triangle types are: type a (upper right quadrant)—“ta”,type b (upper left quadrant)—“tb”, and type d (lower rightquadrant)—“td”.

FIG. 29A shows a diagrammatic representation of the first step in theproximity effect correction (PEC) scheme, where the area fractionswritten in each subfield 2804 are calculated. Given the IC pattern data2801, defined relative to the X-axis 2809 and Y-axis 2810, the numbersof subfields M_(X) 2923 and My 2922 along each axis are:M _(X)=(IC X-dimension in μm)/(2 μm)(rounded down)M _(Y)=(IC Y-dimension in μm)/(2 μm)(rounded down)Note that the subfield numbering along the X-axis 2809 goes from 0 toM_(X) 2923 and along the Y-axis 2810 from 0 to M_(Y) 2922, so the totalnumber of subfields in the IC pattern data=M=(M_(X)+1) (M_(Y)+1). If allsubfields are to be written with a single beam size, thenM_(datasets)=M, where M_(datasets) is the number of subfield datasetsrequired. If some subfields are to be written with multiple beam sizes,then M_(datasets)>M. For example, if

N_(j)=the number of subfields to be written with j different beam sizes

Where j=1, 2, . . . .

Then

${\sum\limits_{j = 1}^{\infty}N_{j}} = {{M\mspace{14mu}{and}\mspace{14mu}{\sum\limits_{j = 1}^{\infty}\left( {j\; N_{j}} \right)}} = M_{datasets}}$It is unlikely that more than 2-3 different beam sizes will be optimalfor any one subfield due to the time overheads required for setting upeach beam size.

Now for each subfield 2804, the total fraction of the subfield area tobe written is calculated. Examples are:

-   -   subfield (2,1) 2925 which is fully written [could be part of a        bonding pad] so its fraction=1.0 and the value of byte #7 2816        in the subfield header 2811 would be=255.    -   subfield (5,4) 2926 which is heavily written at around 70% of        the subfield area, so its fraction=˜0.7 and the value of byte #7        2816 in the subfield header 2811 would be=179≈0.7×255.    -   subfield (11,7) 2927 which is sparsely written at around 15%,        giving a fraction of ˜0.15 and the value of byte #7 2816 in the        subfield header 2811 would be=38≈0.15×255.        Once the total fraction to be written is calculated for each        subfield 2804, the data is stored in byte #7 2816 of the        subfield data header. If multiple beam sizes are to be used for        any particular subfield, the value for the total area to be        written is stored in byte #7 2816 of each subfield dataset—the        total area to be written in this case would be the sum of the        values of byte #7 2816 for all of the datasets for that        particular subfield 2804. Note that the calculation of total        area to be written for each subfield 2804 is completely        independent of the areas to be written in other subfields 2804.

FIG. 29B shows a diagrammatic representation of the second step in thePEC scheme, where the backscattered electron (BSE) dose at subfield 2937is being calculated, assuming no PEC corrections to the primary beamdoses in any subfields 2804. The IC pattern data 2801 is the same as inFIG. 29A. For each subfield (i, j), [where i=0 to M_(X) and j=0 toM_(Y)], a weighted sum of the backscattered electron dose from allneighboring subfields is calculated using the relative intensity graphshown. With increasing radius 2931 away from subfield (i, j) 2937, thecontributions drop off as shown by curve 2934, plotted against therelative intensity scale 2932. The BSE distribution is assumed to beisotropic, so that the BSE contributions to the total dose at subfield2937 will be the same around the circle 2938. The maximum possiblebackscattered contribution is η 2936, the backscattered electroncoefficient—this is relevant for the eight subfields directly aroundsubfield (i, j) and for subfield (l, j), itself. The contribution fromeach subfield is proportional to the fraction of that subfield beingwritten, as calculated in step 1. (FIG. 29A). The formula for the totalbackscattered dose d(i, j) at subfield (i, j) is then:R(m,n,i,j)≡√[(m−i)²+(n−j)²](2 μm)=radius from (m,n) to (i,j)

-   -   s[R(m, n; i, j)]=relative intensity at subfield (i, j) from BSE        scattering at subfield (m, n)    -   f(m, n)=fraction of area written in subfield (m, n)    -   p(m, n)≡1 for now (will be varied in the next step)    -   K=scale factor

$\begin{matrix}{{d\left( {i,j} \right)} = {K{\sum\limits_{m = 0}^{M_{X}}{\sum\limits_{n = 0}^{M_{Y}}{{s\left\lbrack {R\left( {m,{n;i},j} \right)} \right\rbrack}{f\left( {m,n} \right)}{p\left( {m,n} \right)}}}}}} & \left( {{eq}.\mspace{11mu} 1} \right)\end{matrix}$Note that the summation over m and n includes subfield (i, j) sincebackscattered electrons from within the subfield (i, j) being calculatedalso contribute to the BSE background dose.

FIG. 29C shows a diagrammatic representation of the third step in thePEC scheme, where the total dose at each subfield is calculated bycombining the primary beam dose plus the BSE dose. The physical processoccurring is that within each pattern being written in subfield (i, j),there are three contributions to the resist dose:

(1) primary electrons in the writing beam for the pattern being written

(2) backscattered electrons from other patterns within subfield (i, j)

(3) backscattered electrons from neighboring subfields (m, n).

FIG. 29C shows how the writing dose can be reduced to compensate forcontributions (2) and (3), a process familiar to those skilled in theart called proximity effect correction (PEC). At the left, the doseprofile 2942 (plotted against the relative axis 2941) corresponds to thecase of a minimal BSE background dose, thus no PEC is needed. Formaximum process latitude, it is beneficial to adjust the writing dose sothat the resist exposure dose occurs at the points of maximum slope inthe dose profile, in this case at points 2945. Variations in resistprocessing or writing beam currents will then have a minimal effect online width variation. The writing dose 2951 is twice the level of therequired exposure dose 2950 with no PEG.

The middle example shows the case for a medium level of BSE background2948 at about 30% of the exposure dose. To maintain process latitude,the writing dose 2943 has been reduced by the same percentage, or twicethe amount of BSE background 2948 as shown, thus maintaining points 2946at the exposure dose indicated by the dashed line. The exposure dose isreduced by twice as much because the writing dose 2951 is twice theexposure dose 2950.

The right example represents dense lines and spaces, where the largestBSE background occurs. In this example, the BSE background 2949 is about60% of the exposure dose 2950, requiring a 60% reduction in the writingdose 2944.

After the BSE background d(i, j) for all i=0, . . . , M_(X) and j=0, . .. , M_(Y) has been determined, the first-pass dose correction can bedone. For all subfields (i, j), calculate the correction factor p(i, j):p(i,j)=1−2d(i,j)Now recalculate all the values of d(i, j) using these new values forp(i, j)—the result will give smaller values for d(i, j), which, in turnwill give larger values for p(i, j). Thus, the process of finding aself-consistent solution for p(i, j) is oscillatory, but typicallyconverges within a few cycles. Once the values for p(i, j) are no longerchanging by some preset limit, the process is terminated and thecalculated values for p(i, j) are multiplied by 255 and stored in byte#6 2815.Typical Electrode Voltages for the Column in FIG. 2A

Tip Voltage 201 0 V Extraction Electrode 202 2800-3400 V typical FirstSource Lens Electrode 203 432-638 V in this example (FIG. 16D)Beam-limiting Aperture 204 = First Source Lens Electrode 203 SecondSource Lens Electrode 205 512 V Source Mounting Plate 206 512 V UpperAlignment Deflector/Stigmator 818 V ± Deflection and 207 StigmationVoltages Lower Alignment Deflector 208 5000 V ± Deflection VoltagesBeam-Trimming Aperture 5000 V Upper Blanker 277 5000 V ± BlankingVoltages (~1.7 V) Lower Blanker 278 5000 V ± Blanking Voltages (~1.54 V)Beam-Defining Aperture Mount 220 5000 V Patterned Beam-Defining Aperture212 5000 V Upper Mainfield Deflector 213 5000 V ± Deflection Voltages(<3 V) Lower Mainfield Deflector 214 5000 V ± Deflection Voltages (<3 V)Subfield Deflector/Stigmator 215 5000 V ± Deflection & StigmationVoltages (<1 V) Focus-1 Electrode Assembly 216 5000 V ± Lens OffsetVoltages (<3 V) Focus-2 Electrode Assembly 217 ~4906 V to ~5220 V ± LensOffset Voltages (<100 V) Field-Free Tube 218 49986 V Detector Assembly219 54000 V Voltage Contrast Plate 220 49986 V Substrate 221 50000 V

One possible writing strategy to utilize one or more electron opticalcolumns to write a series of stripes on a resist-covered wafer is shownin FIG. 27B. As an example, assume a 6×6 array of identical columns ispositioned above a 300 mm wafer. The column spacing can then bedetermined:

$\begin{matrix}{{{Column}\mspace{14mu}{spacing}} = {\left( {{wafer}\mspace{14mu}{diameter}} \right)/\left. \sqrt{}\left( {{number}\mspace{14mu}{of}\mspace{14mu}{columns}} \right) \right.}} \\{= {{\left( {300\mspace{14mu}{mm}} \right)/\left. \sqrt{}\left( {6 \times 6} \right) \right.} = {{\left( {300\mspace{14mu}{mm}} \right)/6} = {50\mspace{14mu}{mm}}}}}\end{matrix}$Each column will only need to write a 50 mm×50 mm square area of thewafer. When a particular column has completed writing its area, each ofthe other 35 columns will have simultaneously completed writing theirrespective areas and the wafer is complete. The area to be written byeach column is broken down into a series of 50 μm wide parallel stripesas shown in FIG. 27A, where the total number of stripes was determinedto be 1000.

Within each stripe, a column writes on the resist in a series of“flashes”, each exposing a square area using the high current densitybeam on a resist with a pre-determined sensitivity (assumed to be 5μC/cm²). The time per flash is then determined by the beam currentdensity at the outer edges of the shaped beams. As shown in FIG. 21C,the beam current densities range from 2000 A/cm² (30 nm and 120 nmsquare beams), to 2500 A/cm² (−80 nm square beam) up to 3000 A/cm² (40nm square beam):

$\begin{matrix}{{{Time}\mspace{14mu}{per}\mspace{14mu}{flash}} = {\left( {{resist}\mspace{14mu}{sensitivity}} \right)/\left( {{beam}\mspace{14mu}{current}\mspace{14mu}{density}} \right)}} \\{= {{\left( {5\mspace{14mu}\mu\; C\text{/}{cm}^{2}} \right)/\left( {3000\mspace{14mu} A\text{/}{cm}^{2}} \right)} = {1.67\mspace{14mu}{ns}}}} \\{= {{\left( {5\mspace{14mu}\mu\; C\text{/}{cm}^{2}} \right)/\left( {2500\mspace{14mu} A\text{/}{cm}^{2}} \right)} = {2.00\mspace{14mu}{ns}}}} \\{= {{\left( {5\mspace{14mu}\mu\; C\text{/}{cm}^{2}} \right)/\left( {2000\mspace{14mu} A\text{/}{cm}^{2}} \right)} = {2.50\mspace{14mu}{ns}}}}\end{matrix}$These calculated flash times are graphed in FIG. 21C.

Each flash requires that the beam be deflected to a new position on thewafer surface, thus a 1 ns set-up time has been assumed. The total pixelwriting time is then determined by:Total pixel writing time=(# flashes/subfield)[(time/flash)+(set-uptime)]where a subfield is assumed to be 2.0 μm×2.0 μm

The overall pattern density determines the average #flashes/subfield—this is left as a variable in FIG. 30. As would beexpected, higher pattern densities require more flashes/subfield 3001 onaverage, with a resultant lower patterning throughput 3002.

As the stage moves along the length of the stripe (alternately in the +Yand −Y directions 2707—see FIG. 27B), the electron beam iselectrostatically scanned perpendicularly 2740 (along the X-axis) acrossthe width 2715 of the stripe. With the 50 μm stripe assumed here, thetotal number of subfields/scan was determined in FIG. 27A to be 25.Including a 10 ns scan retrace time, the total time per scan will thenbe:Time/scan=(# subfields/scan)(time/subfield)+(scan retrace time)In this writing strategy, scanning is accomplished using electrostaticbeam deflection=±(scan width)/2 relative to the optical axis. The totalnumber of scans required to write the length of an entire stripe can nowbe found (where the stripe length=column spacing):

$\begin{matrix}{{\#\mspace{14mu}{scans}} = {\left( {{column}\mspace{14mu}{spacing}} \right)/\left( {{subfield}\mspace{14mu}{dimension}} \right)}} \\{= {{\left( {50\mspace{14mu}{mm}} \right)/\left( {2.0\mspace{14mu}\mu\; m} \right)} = 25000}}\end{matrix}$One strategy for the stage motion during writing is to move continuouslyunder the writing beams (one per column). In this case, the stage speedwill be:Stage speed=(subfield dimension)/(time/scan)

With the number of flashes/subfield as a variable, the stage speedranges from ˜550 mm/s (limited by the 1 g=9800 mm/s² stage accelerationand the 50 mm length of stripes 2702) down to <50 mm/s, decreasing aseither the number of flashes/subfield increases or as the beam currentdensity decreases.

Finally, a 45 s overhead has been assumed for each wafer to allow forwafer transfer, global alignment, local alignment, and all otherfunctions required between the end of writing one wafer and beginningwriting on the next. The total time per wafer then consists of thecombination of the writing times for all stripes+stage turn-around timesfor all stripes+wafer overhead. Throughput is inversely proportional tothe total time per wafer.

FIG. 30 is a graph of calculated throughput 3002 against the averagenumber of flashes per subfield 3001 for one lithographic module havingvarious numbers of columns from 6×6 up to 10×10, assuming a requiredexposure current 3003 of 3000 A/cm²—this corresponds to an optimized 40nm square beam. Subfields are assumed to be 2 μm square with averagenumbers of flashes/subfield ranging from 40 to 360. Curve 3005corresponds to a 6×6 column array, with each column writing an area of50 mm×50 mm. Curve 3006 corresponds to a 7×7 column array, where eachcolumn writes no more than 42.9 mm×42.9 mm. Curve 3007 corresponds to an8×8 column array, where each column writes no more than 37.5 mm×37.5 mm.Curve 3008 corresponds to a 9×9 column array, where each column writesno more than 33.4 mm×33.4 mm. Finally, curve 3009 corresponds to a 10×10column array, where each column writes no more than 30 mm×30 mm. Forlarge numbers of flashes (>160/subfield), throughput is roughlyinversely proportional to the average number of flashes, while, forsmaller numbers of flashes in region 3004, throughput is limited by themaximum stage acceleration (assumed to be 9800 mm/s²=1 g). Note that ifthe entire 2 μm square subfield were to be written with a 40 nm beam,this would require a prohibitively large number of flashes: [(2 μm)/(40nm)]²=2500 flashes—this underlines the need for variable-sized beams.

Similar graphs for 30 nm, ˜80 nm and 120 nm beams can be plotted,wherein the current densities shown in FIG. 21B are used. For all beamsizes other than the (optimized) 40 nm square beam, the throughputs areslightly decreased from those shown in FIG. 30.

With a 120 nm square beam spaced on 125 nm centers, an entire 2 μmsquare subfield could be written with: [(2 μm)/(125 nm)]²=256flashes—this is an acceptable number, even allowing for the required2.50 ns dwell time. It is important to be able to completely fill entiresubfields in a reasonable time because with the large numbers of columnspossible using the column design described here, it is likely that atleast one column at any time will be writing a bonding pad, while theother columns are writing areas with finer features. To maintainthroughput, it is necessary that the system is able to maintain thewriting speed of all columns since the writing strategy requires thatall columns stay in synchronism while writing.

The invention described above can be extended to include the case of twobeam-defining apertures in a single electron beam column. The twoapertures could be used together to define the beam at the substrate.The two apertures are both centered on the optic axis and are axiallyseparated from each other. Further patterned beam-defining apertures maybe added, as described above, to give a multiplicity of apertures in asingle column.

Multiple beam-defining apertures may be incorporated in an electron beamcolumn to allow a choice of different beam shapes at the substrate. Theapertures may be attached to a single aperture blade and then moved onaxis as needed; alternatively, they may be attached to separateretractable aperture blades in different parts of the column; in afurther alternative they may be positioned close to the optic axisbetween upper and lower deflection optics, allowing the desired apertureto be selected by deflection of the beam (using the upper deflectionoptics) with the beam then redeflected onto the optic axis (afterpassing through the selected aperture) using the lower deflectionoptics; etc.

The electron optics may be configured to allow the electron beam to beexpanded, reduced, or distorted, such that the beam at the substratebecomes an expanded, reduced or distorted version of the shapedetermined by the beam-defining aperture. An example of a usefuldistortion of a square beam would be a reduction along one axis so as toform a rectangle. Other distortions might include conversion of a squarebeam into a beam shaped as a parallelogram. Electron optical elementsthat might be used to achieve such effects include quadrupole andoctupole lenses.

Although the design procedure for the patterned beam-defining aperture212 described herein employed numerical methods, an alternativeanalytical method is also possible. Referring to FIG. 1, the functionsof blocks 102-106 remain the same, however, in block 108, instead ofnumerical ray-tracing, an analytical model of the operation of theoptics is generated and then used to determine which rays of thecircular beam pass within the desired patterned beam profile, and whichrays pass outside the desired patterned beam profile. The analyticalmodel of the optics is generated using ray-tracing, however, thisanalytical approach offers the opportunity to potentially improve thePBDA 212 design by reducing the effects of numerical errors in theray-tracing calculations. This improvement is accomplished by smoothingthe analytical model derived from the ray-tracing calculations to evenout small (nm-scale) fluctuations in ray intercept values at the wafersurface 221. Once this analytical procedure has been used to generatethe PBDA design in block 112, the remainder of the PBDA design proceduredescribed in FIG. 1 is the same.

For the design illustrated in the example herein, the practical range ofbeam sizes is approximately 30 nm up to 120 nm. For other electronoptical designs embodying the present invention, the range in beam sizescould be from 15-20 nm up to 400-500 nm.

1. A lithography tool for patterning resist coated substratescomprising: a charged particle source, configured to produce a chargedparticle beam; a first lens positioned below said charged particlesource, said first lens being configured to form said charged particlebeam into a substantially laminar charged particle beam; a stagepositioned below said first lens, for carrying said resist coatedsubstrates; a second lens positioned between said first lens and saidstage, said second lens being configured to focus said substantiallylaminar charged particle beam onto the surface of said resist coatedsubstrate; and an alignment deflector/stigmator positioned between saidfirst lens and said second lens, said alignment deflector/stigmatorcomprising eight electrodes in an octupole configuration.
 2. Alithography tool as in claim 1, wherein said eight electrodes areelectrically connected to an alignment deflector control configured tosupply voltages to each of said eight electrodes in said alignmentdeflector/stigmator to simultaneously generate a rotatable quadrupoleelectric field transverse to said charged particle beam for stigmatingsaid charged particle beam and a rotatable dipole electric fieldtransverse to said charged particle beam for deflecting said chargedparticle beam.
 3. A lithography tool as in claim 1, further comprising abeam blanker positioned between said alignment deflector/stigmator andsaid second lens, for blanking said substantially laminar chargedparticle beam.
 4. A lithography tool for patterning resist coatedsubstrates comprising: a charged particle source, configured to producea charged particle beam; a first lens positioned below said chargedparticle source, said first lens being configured to form said chargedparticle beam into a substantially laminar charged particle beam; astage positioned below said first lens, for carrying said resist coatedsubstrates; a second lens positioned between said first lens and saidstage, said second lens being configured to focus said substantiallylaminar charged particle beam onto the surface of said resist coatedsubstrate; an alignment deflector/stigmator positioned between saidfirst lens and said second lens, said alignment deflector/stigmatorcomprising eight electrodes in an octupole configuration; a patternedbeam-defining aperture positioned between said alignmentdeflector/stigmator and said second lens, said patterned beam-definingaperture being configured to block a large portion of charged particlesin said substantially laminar charged particle beam that cannot befocused by said second lens into a predetermined beam profile at thesurface of said resist coated substrate; and wherein said electronsource, first lens, alignment deflector/stigmator, patternedbeam-defining aperture, and second lens are configured (1) to form anon-circular shaped beam at the surface of said resist coated substrateand (2) to map charged particle current passing through multipleseparated areas of said beam-defining aperture onto a single area atsaid resist coated substrate.
 5. A lithography tool as in claim 4,wherein said eight electrodes are electrically connected to an alignmentdeflector control configured to supply voltages to each of said eightelectrodes in said alignment deflector/stigmator to generate a rotatabledipole electric field transverse to said charged particle beam fordeflecting said charged particle beam.
 6. A lithography tool as in claim4, wherein said eight electrodes are electrically connected to analignment deflector control configured to supply voltages to each ofsaid eight electrodes in said alignment deflector/stigmator to generatea rotatable quadrupole electric field transverse to said chargedparticle beam for stigmating said charged particle beam.
 7. Alithography tool as in claim 4, wherein said eight electrodes areelectrically connected to an alignment deflector control configured tosupply voltages to each of said eight electrodes in said alignmentdeflector/stigmator to simultaneously generate a rotatable quadrupoleelectric field transverse to said charged particle beam for stigmatingsaid charged particle beam and a rotatable dipole electric fieldtransverse to said charged particle beam for deflecting said chargedparticle beam.
 8. A lithography tool as in claim 4, further comprising abeam blanker positioned between said alignment deflector/stigmator andsaid patterned beam-defining aperture, for blanking said substantiallylaminar charged particle beam.
 9. A lithography tool for patterningresist coated substrates comprising: a charged particle source,configured to produce a charged particle beam; a first lens positionedbelow said charged particle source, said first lens being configured toform said charged particle beam into a substantially laminar chargedparticle beam; a stage positioned below said first lens, for carryingsaid resist coated substrates; a second lens positioned between saidfirst lens and said stage, said second lens being configured to focussaid substantially laminar charged particle beam onto the surface ofsaid resist coated substrate; and a beam deflector positioned betweensaid first lens and said second lens, wherein said beam deflector is adouble deflector, configured to allow telecentric scanning of said beam;wherein said second lens is configured to allow the effective axis ofsaid second lens to move paraxially with said beam during saidtelecentric scanning.
 10. A high throughput charged particle directwrite lithography system comprising: a charged particle optical assemblyconfigured to (1) produce a multiplicity, N, of high current densitycharged particle non-circular shaped-beams focused on a specimen planeand (2) vector scan said charged particle shaped-beams across saidspecimen plane; wherein each of said multiplicity of high currentdensity charged particle shaped-beams has a current density, I_(a), andan area A which satisfy the equations:I_(a)≧2000 Amperes per square centimeter;100≧N≧36;A=p²; and120>p>30 nanometers.
 11. A charged particle direct write lithographysystem as in claim 10, wherein said charged particle optical assemblycomprises a multiplicity of electron beam columns each with a patternedbeam defining aperture.